Filtration of Polymerization Initiators for Semiconductor Lithography

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Solution Overview

Problem

Current methods for removing metal impurities from polymerization initiators used in semiconductor lithography are laborious and not suitable for commercial-scale production, leading to high metal content in copolymers, which affects the electrical properties of semiconductors.

Innovation Solution

A method involving the filtration of a polymerization initiator solution through a filter with a nominal pore size of not more than 1.0 μm to reduce metal impurities, specifically sodium content, to below 300 ppb, allowing for the production of copolymers with reduced metal content.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If conventional methods for removing metal impurities from polymerization initiators are used, then metal content in copolymers is reduced, but the production process becomes laborious and unsuitable for commercial-scale production

Engineering Contradiction:
Improvemetal content in copolymerVSAvoidcommercial-scale production capability
Core Design Contradiction:
Manufacturing precisionVSProductivity

Solution Approach 1:

The invention extracts metal impurities from the polymerization initiator solution through a simple filtration process using a filter with specific pore size (1 μm or less), separating the harmful metal components from the polymerization initiator without requiring complex operational steps, thereby enabling both high purity and commercial-scale production

Inventive Principle:
Principle #2Taking out (Extraction)

Solution Approach 2:

The invention changes the physical parameter of the filter pore size to 1 μm or less, which optimally removes metal impurities while maintaining process simplicity and scalability for commercial production, resolving the contradiction between purification effectiveness and production efficiency

Inventive Principle:
Principle #35Parameter changes

2Manufacturing precision

If conventional purification methods are applied to polymerization initiators, then metal impurities are removed, but the process requires laborious steps and major apparatus modifications

Engineering Contradiction:
Improvemetal content reductionVSAvoidapparatus modification requirement
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The invention employs a simple, disposable filter with pore size of 1 μm or less that can be easily integrated into existing apparatus without major modifications, providing effective metal removal through a single-use component that avoids complex and expensive apparatus changes

Inventive Principle:
Principle #27Cheap short-living objects (Disposable)

Solution Approach 2:

The invention utilizes a porous filter material with specifically controlled pore size (1 μm or less) to physically trap metal impurities in the polymerization initiator solution, achieving purification through the inherent filtering capability of the porous structure without requiring complex chemical or mechanical systems

Inventive Principle:
Principle #31Porous materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach efficiently and cost-effectively reduces metal impurities in polymerization initiators, enabling the production of copolymers with extremely low metal content without requiring major apparatus modifications or laborious steps, thereby improving the electrical properties of semiconductors.

Implementation Method 1

a method involving the filtration of a polymerization initiator solution through a filter with a nominal pore size of not more than 1.0 μm to reduce metal impurities

Methodology Applied
Scientific EffectFiltration: Filter (physical)

Data Source

PatentUS9546133B2Method for producing copolymer for semiconductor lithography containing reduced amount of metal impurities, and method for purifying polymerization initiator for production of copolymer
Publication Date: 2017.01.17 MARUZEN PETROCHEMICAL CO LTD
  • US9546133B2 patent drawing
  • US9546133B2 patent drawing
  • US9546133B2 patent drawing

AI summary

A method for producing a copolymer for semiconductor lithography containing less metal impurities, and a method for purifying a polymerization initiator for production of the copolymer, are provided. The method for purifying a polymerization initiator to be used for production of a polymer includes a filtering step wherein a solution of a polymerization initiator dissolved in an organic solvent is allowed to pass through a filter having a nominal pore size of not more than 1.0 μm, to reduce the sodium content of the polymerization initiator solution to not more than 300 ppb with respect to the weight of the polymerization initiator. Further, the method for producing a copolymer for semiconductor lithography includes a polymerization step wherein the polymer for semiconductor lithography is synthesized by a radical polymerization reaction in the presence of a polymerization initiator purified by the above purification method.