Fin-Based Fill Cell Optimization for FinFET Layout Compliance
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current semiconductor manufacturing processes face challenges in ensuring design rule compliance due to mismatches in the number of active fins in adjacent regions of FinFET structures, leading to potential functional issues and yield reductions.
Innovation Solution
A method for fin-based fill cell optimization is introduced, which dynamically selects and inserts fill cells based on the number of active fins on each edge, iteratively filling gaps to satisfy set fin rules, thereby ensuring design rule compliance without the need for additional design rule checks.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If traditional fill cells are used without fin-based optimization, then the layout filling process is simpler, but design rule violations occur due to mismatches in active fin numbers between adjacent regions
Solution Approach 1:
The patent applies local quality by making fill cells adaptive to their specific local context. Each fill cell is configured with a specific number of active fins based on the fin counts of adjacent logic cells. The system analyzes the local fin configuration and inserts fill cells with matching fin characteristics, ensuring design rule compliance at each local interface while maintaining overall layout integrity.
Solution Approach 2:
The patent implements parameter changes by dynamically adjusting the number of active fins in fill cells based on the surrounding layout configuration. Instead of using a fixed fill cell design, the system varies the fin parameter (number of active fins) to match adjacent regions, thereby preventing fin number mismatches and ensuring compliance with design rules that require continuous fin structures across cell boundaries.
2Reliability
If fin-based fill cell optimization is implemented, then design rule compliance is guaranteed, but the layout processing time and computational complexity increase
Solution Approach 1:
The patent applies preliminary action by performing fin-based fill cell optimization during the layout synthesis stage, before final design rule checking. The system proactively identifies regions requiring fill cells and configures them with appropriate fin characteristics in advance, preventing design rule violations before they occur. This preliminary configuration eliminates the need for iterative design rule checking and correction, reducing overall processing time.
Solution Approach 2:
The patent implements feedback by using design rule requirements as input constraints for the fill cell insertion process. The system continuously references fin rules and adjacent cell configurations to determine appropriate fill cell parameters, creating a closed-loop process that ensures compliance. This feedback mechanism guides the automated tool to make correct decisions without requiring multiple validation cycles.
3Reliability
If the number of active fins in fill cells is increased to match adjacent regions, then fin rule compliance is achieved, but the fill cell area and device density are reduced
Solution Approach 1:
The patent applies local quality by precisely matching the fin configuration of fill cells to the immediate local requirements. Instead of uniformly increasing fill cell size across all cases, the system analyzes each specific interface and configures fill cells with the minimum necessary fin characteristics to achieve compliance. This localized approach minimizes the area penalty while ensuring design rule satisfaction at each boundary.
Solution Approach 2:
The patent implements partial action by applying fin-based optimization only where necessary at cell interfaces, rather than uniformly across all fill cells. The system identifies specific locations where fin number mismatches would occur and applies fill cell configuration changes only at those critical interfaces, leaving other areas unchanged. This selective approach minimizes the overall impact on device density while ensuring compliance where required.
Data Source
AI summary
Methods, systems and computer program products for providing fin-based fill cell optimization are provided. Aspects include receiving a semiconductor layout comprising at least a first logic cell, a second logic cell, and a fill cell. A left boundary of the fill cell is adjacent to the first logic cell and a right boundary of the fill cell is adjacent to the second logic cell. Aspects also include determining a number of active left fins, right fins, and active fill cell fins associated with FinFET structures of the first logic cell, second logic cell and fill cell, respectively. Aspects also include comparing the number of active fins to a set of fin rules. Responsive to determining that the semiconductor layout violates the set of fin rules, aspects include modifying the semiconductor layout to change the number of active fill cell fins to satisfy the set of fin rules.