Fine Particle Detection via Supercritical Fluid Precipitation
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Solution Overview
Problem
Current particle detectors, such as ICP-MS and LPC, struggle to distinguish between impurities and noise, particularly for dissolved silicon impurities with a particle diameter size of less than 20 nm, leading to poor detection capabilities in semiconductor cleaning liquids, which can cause significant yield losses.
Innovation Solution
A particle detection method and system utilizing supercritical fluid extraction (SFE) to precipitate fine particles from a polar solvent, followed by separation and analysis using an analyzer like ICP-MS or LPC, enhancing detection capabilities for metals, metalloids, and their compounds.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If current particle detectors (ICP-MS or LPC) are used to detect fine particles in semiconductor cleaning liquids, then the detection process can be performed, but the detection precision is poor for particles less than 20 nm due to inability to distinguish impurities from noise
Solution Approach 1:
The patent applies preliminary action by performing pre-concentration of fine particles from the cleaning liquid before analysis. The system collects and concentrates particles from a large volume of liquid into a smaller volume, ensuring that even sub-20nm particles are sufficiently concentrated for detection. This preliminary concentration step enhances the detectability of trace impurities that would otherwise be lost in the noise of the original sample matrix.
Solution Approach 2:
The patent applies extraction by isolating fine particles from the complex cleaning liquid matrix. The system extracts particles through filtration and concentration steps, separating them from dissolved substances and other interfering components. This extraction process enables the detector to focus on particulate impurities specifically, improving the ability to distinguish true particle signals from background noise.
2Reliability
If a particle detector with high analytical sensitivity is required to effectively analyze and monitor chemical materials, then detection capability should be improved, but no suitable particle detector capable of replacing current detectors exists
Solution Approach 1:
The patent applies merging by combining multiple functions into an integrated system. The system merges particle collection, concentration, filtration, and detection capabilities into a single unified platform. This integration creates a new type of particle detector that achieves high analytical sensitivity for sub-20nm particles while maintaining versatility for analyzing various semiconductor cleaning liquids, effectively filling the gap for a suitable replacement detector.
Solution Approach 2:
The patent applies parameter changes by systematically optimizing detection parameters including particle size thresholds, concentration levels, and detection thresholds. The system adjusts these parameters to maximize sensitivity for fine particles while maintaining discrimination against noise. This parameter optimization enables the detector to achieve reliable detection of particles less than 20 nm, providing the analytical sensitivity needed to replace current detectors.
3Productivity
If fine particle impurities in semiconductor cleaning liquids are not properly detected and controlled, then yield losses occur due to residues on semiconductor wafers, but current detectors cannot effectively identify these impurities
Solution Approach 1:
The patent applies preliminary action by implementing comprehensive particle collection and concentration from the cleaning liquid before analysis. The system accumulates particles over time from large sample volumes, ensuring that even trace impurities that could cause wafer residues are concentrated to detectable levels. This preliminary concentration enables reliable detection of low-concentration impurities that current detectors miss, directly supporting productivity improvement through better impurity control.
Solution Approach 2:
The patent applies extraction by isolating fine particle impurities from the cleaning liquid matrix through filtration and concentration steps. This extraction process specifically targets particulate contaminants that could become residues on semiconductor wafers, separating them from the bulk liquid and dissolved substances. By extracting and concentrating these impurities, the system enables precise measurement and control of the very contaminants that threaten productivity and yield.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
Improves the detection of fine particles, reducing semiconductor quality issues and promoting productivity by effectively analyzing and controlling impurities, even at low concentrations.
Implementation Method 1
mixing the analysis sample in which fine particles are dissolved in a polar solvent, with a supercritical fluid and precipitating the fine particles to form a mixture of polar solvent with precipitated fine particles
Implementation Method 2
precipitating the fine particles to form a mixture of polar solvent with precipitated fine particles
Implementation Method 3
separating the polar solvent from the precipitated fine particles
Data Source
AI summary
In accordance with the present disclosure, there may be provided a particle detection method and system with the improved detection ability for fine particles, such as metals, metalloids, and/or compounds thereof, dissolved in a polar solvent. Particle detection methods include performing preprocessing of an analysis sample in which fine particles are dissolved in a polar solvent, and introducing the precipitated fine particles to an analyzer configured to detect particles. Preprocessing may include mixing the analysis sample in which fine particles are dissolved in a polar solvent, with a supercritical fluid; precipitating the fine particles to form a mixture of polar solvent with precipitated fine particles, and supercritical fluid; and separating the polar solvent from the precipitated fine particles.