Fine Pattern Formation Using Metal Etch Stop Layers
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Solution Overview
Problem
Conventional photo lithography methods for forming fine patterns in liquid crystal display devices require additional processes, increasing complexity and cost, especially for high-resolution displays.
Innovation Solution
A method involving sequential formation of fine pattern layers and metal layers on a base substrate, with metal patterns acting as etch stop layers to create fine patterns and polymer patterns for polarization, simplifying the manufacturing process and reducing costs.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional photo lithography is used to form fine patterns, then fine wires and patterns can be formed, but the number of processes increases and manufacturing complexity increases
Solution Approach 1:
The patent combines the formation of fine patterns and metal patterns into a single photo lithography process step. By using a dual-layer structure (fine pattern layer and metal layer) that are patterned simultaneously, the invention eliminates the need for separate process steps, thereby reducing manufacturing complexity while maintaining fine pattern precision.
Solution Approach 2:
The patent divides the pattern formation into distinct functional layers (fine pattern layer and metal layer) that can be independently controlled during the photo lithography process. This segmentation allows each layer to be optimized for its specific function while being formed in the same process step, resolving the contradiction between precision and complexity.
2Manufacturing precision
If new processes or new materials are used to form fine patterns, then fine patterns can be formed, but investment in new facilities and materials increases cost
Solution Approach 1:
The patent makes the existing photo lithography process multi-functional by enabling it to form both fine patterns and metal patterns in a single step. This eliminates the need for new specialized processes or materials, thereby maintaining manufacturing precision while avoiding additional investment in new facilities and materials.
Solution Approach 2:
The invention enables the existing photo lithography equipment to serve itself by forming multiple pattern types (fine patterns and metal patterns) without requiring external new processes. The dual-layer structure allows the same equipment to achieve multiple functions, reducing the need for additional facilities and material investments.
Data Source
AI summary
A method is provided for forming a fine pattern. In the method, a first fine pattern and a first metal pattern are formed by respectively patterning a first fine pattern layer on a base substrate and a first metal layer on the first fine pattern layer. A second fine pattern layer and a second metal layer are sequentially formed over the first fine pattern and the first metal pattern. The second metal layer is patterned, so that a second metal pattern between adjacent portions of the first fine pattern. The second fine pattern layer is patterned using the second metal pattern as a mask, so that a second fine pattern is formed between adjacent portions of the first fine pattern.