Fingerprint Evolution Analysis for Semiconductor Sampling Control
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Solution Overview
Problem
In the semiconductor manufacturing process, accurately determining the contribution of multiple devices to the fingerprint of a processing parameter on a substrate is challenging due to complex multi-layer lithographic processes, leading to inefficiencies in measurement and control strategies, which affects the throughput and accuracy of substrate processing.
Innovation Solution
A method is developed to determine a control scheme for devices processing substrates by obtaining a fingerprint model and an evolution model, analyzing them to generate a sampling control scheme for measurement locations and processing control, and identifying which devices contribute to specific processing parameters, using a combination of fingerprint data and usage data.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If extensive measurement operations are performed on substrates to accurately determine processing parameter fingerprints, then measurement precision is improved, but productivity deteriorates due to increased measurement time and processing overhead
Solution Approach 1:
The patent applies partial action by performing measurements only on selected substrates rather than all substrates. The system identifies representative substrates based on process conditions and performs fingerprint measurements only on these selected samples, reducing overall measurement burden while maintaining sufficient accuracy for process control
Solution Approach 2:
The system performs preliminary analysis of process data to identify which substrates require measurement before actual fingerprint measurement takes place. This preliminary selection step filters out substrates that do not require measurement, reducing unnecessary measurements and improving throughput
2Manufacturing precision
If comprehensive fingerprint analysis is performed on all substrates to identify device contributions, then manufacturing precision is improved, but loss of time increases due to complex analysis requirements
Solution Approach 1:
The system extracts and analyzes only the most relevant features from fingerprint data that are indicative of device contributions. Rather than performing comprehensive analysis on all data, the system identifies and focuses on key diagnostic features that provide sufficient information for device contribution identification, reducing analysis time while maintaining precision
Solution Approach 2:
The analysis process is segmented into multiple stages: initial fingerprint acquisition, feature extraction, device contribution identification, and verification. This segmentation allows the system to perform detailed analysis only where necessary and use simplified analysis for routine cases, reducing overall analysis time
3Measurement precision
If detailed sampling control schemes are implemented to optimize measurement locations, then measurement precision is improved, but device complexity increases due to sophisticated control requirements
Solution Approach 1:
The system implements local quality by applying different measurement strategies to different regions of the substrate based on local process conditions. Rather than using a uniform complex control scheme across the entire substrate, the system adapts measurement locations and parameters to local variations in process conditions, improving precision without requiring globally complex control
Data Source
AI summary
A method of determining a sampling control scheme and/or a processing control scheme for substrates processed by a device. The method uses a fingerprint model and an evolution model to generate the control scheme. The fingerprint model is based on fingerprint data for a processing parameter of at least one substrate processed by a device, and the evolution model represents variation of the fingerprint data over time. The fingerprint model and the evolution model are analyzed and a sampling and/or processing control scheme is generated using the analysis. The sampling control scheme provides an indication for where and when to take measurements on substrates processed by the device. The processing control scheme provides an indication for how to control the processing of the substrate. Also, there is provided a method of determining which of multiple devices contributed to a fingerprint of a processing parameter.