Double-Layer FIR Sensor Absorber for Spectrum and Sensitivity Control
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Solution Overview
Problem
Conventional FIR sensors face challenges in accurately controlling and calibrating the sensing efficiency and frame rate due to the inability to adjust the thickness of the dielectric layer effectively during the CMOS manufacturing process.
Innovation Solution
The FIR sensor is designed with a thinner heat absorption layer and multiple absorption layers, incorporating a silicon nitride layer to enhance absorption efficiency, and a manufacturing method that involves etching sacrificial metal layers to form a double-layer heat absorption structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If the dielectric layer thickness is increased to improve heat absorption, then the heat absorption efficiency is improved, but the sensing efficiency and frame rate control become inaccurate
Solution Approach 1:
The heat absorption layer is segmented into multiple layers with different materials (silicon nitride layer and silicon oxide layer) rather than using a single thick dielectric layer. This segmentation allows independent optimization of each layer's thickness and material properties to achieve both high heat absorption efficiency and precise sensing performance
Solution Approach 2:
The patent employs composite materials by combining silicon nitride and silicon oxide in a multi-layer structure. Each material contributes different thermal and optical properties, enabling the system to achieve superior heat absorption while maintaining controllable sensing characteristics that cannot be achieved with a single material
2Manufacturing precision
If the dielectric layer thickness is decreased to improve sensing efficiency control, then the sensing efficiency and frame rate control are improved, but the heat absorption efficiency deteriorates
Solution Approach 1:
Instead of using a single thin dielectric layer, the heat absorption function is segmented across multiple layers with different materials. The silicon nitride layer provides high heat absorption efficiency while the silicon oxide layer allows for precise thickness control to maintain sensing performance
Solution Approach 2:
The patent changes the material parameters by selecting specific materials (silicon nitride with high heat absorption coefficient) and optimizing their thickness parameters. This allows achieving high heat absorption efficiency without requiring excessive thickness that would compromise sensing control
3Device complexity
If a single heat absorption layer is used to simplify the structure, then the device complexity is reduced, but the absorbable FIR spectrum is limited
Solution Approach 1:
The heat absorption function is segmented into multiple layers with different materials (silicon nitride layer and silicon oxide layer), where each layer absorbs different portions of the FIR spectrum. This segmentation expands the overall absorbable spectrum while maintaining a relatively simple layered structure
Solution Approach 2:
By using composite materials with different optical and thermal properties, the multi-layer structure achieves broader FIR spectrum absorption. The silicon nitride layer absorbs certain wavelength ranges while the silicon oxide layer absorbs complementary ranges, creating a versatile spectral response
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This design improves heat absorption efficiency and expands the absorbable FIR spectrum, resulting in enhanced heat collection capabilities.
Implementation Method 1
forming a thermopile structure on a substrate
Implementation Method 2
forming a double-layer heat absorption layer... expands the absorbable FIR spectrum
Data Source
AI summary
There is provided a far infrared (FIR) sensor device including a substrate, a thermopile structure and a heat absorption layer. The thermopile structure is arranged on the substrate. The heat absorption layer covers upon the thermopile structure, wherein the heat absorption layer has a hollow space which is formed by etching a metal layer in the heat absorption layer.


