Flag Contact Layout for Higher Current in Tight Spaces
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing flag shape contacts have a complex structure due to a riveting structure that constrains insertion, requires cutting out the wire conductor crimping piece from the substrate, resulting in a reduced current carrying capacity and limited suitability for electrical connections with limited space or height.
Innovation Solution
The riveting structure is positioned outside the extension area of the plug-in structure, allowing the crimping piece to be integrated without cutting from the substrate, increasing the substrate's physical area for improved current carrying capacity, simplifying the design, and reducing height by relocating the notch to the side edge of the riveting structure.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Area of stationary object
If the riveting structure is positioned within the extension area of the plug-in structure, then the insertion action is constrained and the structure is compact, but the substrate area is reduced and current carrying capacity decreases
Solution Approach 1:
The riveting structure is repositioned from a planar arrangement within the extension area to a three-dimensional arrangement extending in a second direction distinct from the first direction. This spatial reconfiguration allows the riveting structure to be disposed outside the extension area of the plug-in structure, thereby increasing the substrate area available for current carrying while maintaining structural integration.
2Reliability
If the wire conductor crimping piece is cut out from the substrate, then the riveting structure can be formed, but the substrate has large interspace and current carrying capacity is reduced
Solution Approach 1:
The contact is divided into functionally independent components: the plug-in structure extending in a first direction and the riveting structure extending in a second direction. This segmentation allows each structure to be optimized for its specific function without compromising the other, enabling the riveting structure to be formed without cutting out the wire conductor crimping piece from the substrate, thus eliminating large interspaces and improving current carrying capacity.
3Ease of operation
If the riveting structure includes parallel crimping pieces, then wire and sheath can be crimped, but the structure becomes complex and height increases
Solution Approach 1:
The riveting structure utilizes a second direction distinct from the first direction (plug-in direction) to arrange the crimping pieces. This dimensional change allows the crimping pieces to be disposed in parallel for effective wire and sheath crimping while extending in a direction that does not increase the height of the contact in the plug-in direction, thereby maintaining compact dimensions suitable for space-constrained applications.
Data Source
AI summary
A flag shape contact includes a substrate, and a plug-in structure for receiving a mating contact. The plug-in structure extends from the substrate in a first direction. A riveting structure is provided for riveting or connecting a wire conductor to the contact. The riveting structure extends from the substrate in a second direction, distinct from the first direction. The riveting structure is disposed outside an extension area of the plug-in structure in the first direction.