Flexible Backplate Etching Stopper Layer for Active Layer Protection
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Solution Overview
Problem
The challenge in manufacturing flexible OLED display panels is the risk of damaging the active layer during the etching process, which reduces product yield and flexibility.
Innovation Solution
A manufacturing method involving a substrate with a buffer layer, active layer, and gate insulating layer, where an etching stopper layer is used to prevent damage to the active layer during etching, allowing for the formation of through holes without additional processes, and filling with organic material to enhance flexibility.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Adaptability or versatility
If the panel is perforated to improve flexibility, then the flexibility of the panel is improved, but the active layer is damaged during the etching process
Solution Approach 1:
The patent introduces an etching stopper layer as an intermediary between the active layer and the etching process. This stopper layer is selectively removed in isolation regions to allow etching and improve flexibility, while protecting the active layer from damage. The stopper layer acts as a mediator that enables the etching process to occur only where needed without harming the active layer.
Solution Approach 2:
The patent applies different treatments to different regions of the panel. The etching stopper layer is selectively removed in isolation regions to create through-holes for flexibility, while the active layer regions maintain their integrity. This local differentiation allows the panel to have both flexible isolation regions and protected active layers.
2Adaptability or versatility
If the etching process is performed to create through holes, then the flexibility is improved, but the active layer is damaged
Solution Approach 1:
The etching stopper layer serves as a protective intermediary that enables precise etching control. It allows the etching process to reach the desired depth in isolation regions while automatically stopping before damaging the active layer, thus improving etching precision without sacrificing flexibility.
Solution Approach 2:
The etching stopper layer is formed in advance before the etching process. This preliminary action prepares the structure by creating a protective barrier that guides the subsequent etching process, ensuring that holes are created only in the intended isolation regions without damaging the active layer.
3Reliability
If additional processes are added to protect the active layer, then the active layer is protected, but the manufacturing complexity increases
Solution Approach 1:
The patent combines the formation of the etching stopper layer with existing manufacturing processes. The stopper layer is formed using the same deposition and patterning processes already used for other layers, merging the protective function into the existing process flow rather than adding separate protective steps.
Solution Approach 2:
The etching stopper layer serves multiple functions: it protects the active layer during etching, defines the isolation regions, and enables the creation of through-holes for flexibility. This multi-functionality reduces the need for additional specialized processes, maintaining manufacturing simplicity while providing comprehensive protection.
Data Source
AI summary
The present invention discloses a manufacturing method of flexible backplate, a liquid crystal display panel, and an OLED display panel. The method comprises: providing a substrate; forming a buffer layer, an active layer, and a gate insulating layer on the substrate; forming a gate on the gate insulating layer, and forming an etching stopper layer; forming a second insulating layer on the gate and the etching stopper layer; forming a first through hole in the isolation region, and forming a second through hole in the bonding region; coating an organic material on the second insulating layer and filling the organic material in the first and second through holes to form an organic filling layer; forming a source and a drain on the organic filling layer. By the above way, it does not damage the active layer during the etching process without adding any processes, and improve flexibility of the backplate.