Flexible Display TFT Layout for Low-Power Driving and Safer Routing
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Solution Overview
Problem
Current technologies face challenges in manufacturing display devices that can operate with low power consumption, particularly in portable or wearable devices, where energy efficiency is crucial for thinner and lighter designs.
Innovation Solution
The implementation of a display device design that incorporates a first thin-film transistor with a polycrystalline semiconductor layer and a second thin-film transistor with an oxide semiconductor layer, along with a protective film of inorganic insulation material to prevent short-circuiting, and the formation of openings in the bending area to simplify the manufacturing process.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Use of energy by moving object
If current manufacturing technology is used, then display devices can be produced, but power consumption is high and low power consumption operation is difficult to achieve
Solution Approach 1:
The patent segments the semiconductor layer into two distinct types: amorphous semiconductor layers and crystalline semiconductor layers. This segmentation allows different regions of the display device to use different semiconductor materials optimized for specific functions, enabling low power consumption operation while maintaining manufacturing feasibility through specialized processing steps for each layer type.
Solution Approach 2:
The patent changes the physical and chemical parameters of the semiconductor material by transitioning from amorphous to crystalline structures. This parameter change fundamentally alters the electrical properties, enabling ultra-low power consumption operation while the manufacturing process parameters are adjusted accordingly to accommodate the crystalline formation through controlled heating and cooling cycles.
2Ease of manufacture
If openings in bending area and contact holes are formed through separate processes, then manufacturing precision can be maintained, but manufacturing complexity and time increase
Solution Approach 1:
The patent merges the formation of openings in the bending area and contact holes into a single simultaneous etching process. By using a unified mask pattern and etching conditions, both features are created in one step, significantly simplifying the manufacturing process while maintaining precision through carefully controlled etching parameters and mask design that account for the different locations and requirements of openings and contact holes.
3Area of stationary object
If high potential supply line and low potential supply line are placed close together, then device area is reduced, but short-circuiting risk increases
Solution Approach 1:
The patent introduces an intermediary insulating layer between the high potential supply line and low potential supply line. This intermediate layer acts as a physical barrier that prevents direct contact and potential short-circuiting between the two conductors. The insulating material and its thickness are carefully selected to provide adequate electrical isolation while minimizing the vertical space required, thus reducing overall device area without compromising reliability.
Data Source
AI summary
Disclosed is a display device that is capable of being driven with low power consumption. A first thin-film transistor including a polycrystalline semiconductor layer and a second thin-film transistor including an oxide semiconductor layer are disposed in an active area, thereby reducing power consumption. At least one opening formed in a bending area is formed to have the same depth as any one of contact holes formed in the active area, thereby making it possible to form the opening and the contact holes through the same process and consequently simplifying the process of manufacturing the device. Since a high potential supply line and a low potential supply line overlap each other with a protective film formed of an inorganic insulation material interposed therebetween, short-circuiting of the high potential supply line and the low potential supply line may be prevented.


