Flexible Electrochromic Device via Electrophoretic Deposition

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Solution Overview

Problem

Existing flexible nanocrystalline electrochromic devices face challenges in achieving high reliability and display performance due to the need for high-temperature processing of semiconductor materials on flexible substrates, resulting in insufficient contrast and long response times.

Innovation Solution

A flexible electrochromic device is manufactured using a method that includes forming a patterned transparent electrode with an insulating layer on non-patterned areas, a nanocrystalline semiconductor layer formed via electrophoretic deposition and compression, and an electrochromic monolayer, with a counter electrode and electrolyte, to improve operational properties and contrast.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If nanocrystalline semiconductor material is formed at high temperatures of 450°C or more, then desired semiconductor properties are achieved, but application on flexible transparent substrate becomes difficult

Engineering Contradiction:
Improvesemiconductor material reliabilityVSAvoidflexible substrate compatibility
Core Design Contradiction:
ReliabilityVSEase of manufacture

Solution Approach 1:

The patent changes the temperature parameter from high temperature (450°C or more) to low temperature (200°C or less) by using electrophoretic deposition instead of conventional high-temperature sintering. This allows the semiconductor layer to be formed on flexible substrates while maintaining functional properties through the electrophoretic self-assembly mechanism rather than thermal processing.

Inventive Principle:
Principle #35Parameter changes

2Ease of manufacture

If metal oxide is formed at low temperatures of 200°C or less on flexible substrate, then flexible substrate compatibility is achieved, but high reliability of TiO2 cannot be assured

Engineering Contradiction:
Improveflexible substrate compatibilityVSAvoidTiO2 reliability
Core Design Contradiction:
Ease of manufactureVSReliability

Solution Approach 1:

The patent replaces the thermal field (heat-based sintering) with an electric field (electrophoretic deposition) to form the semiconductor layer. This substitution allows low-temperature processing on flexible substrates while achieving reliable TiO2 film formation through electrophoretic self-assembly and subsequent compression, eliminating the need for high-temperature thermal treatment.

Inventive Principle:
Principle #28Mechanics substitution (Replace mechanical system)

Solution Approach 2:

The patent changes the formation temperature parameter from high temperature (450°C) to low temperature (200°C or less) by using electrophoretic deposition. Additionally, it introduces a compression step to enhance film density and reliability, compensating for the lower formation temperature and ensuring adequate semiconductor properties on flexible substrates.

Inventive Principle:
Principle #35Parameter changes

3Ease of manufacture

If conventional electrophoretic deposition is used without compression, then manufacturing simplicity is maintained, but low contrast and long response time are achieved

Engineering Contradiction:
Improvemanufacturing simplicityVSAvoiddisplay performance
Core Design Contradiction:
Ease of manufactureVSManufacturing precision

Solution Approach 1:

The patent performs compression as a preliminary action after electrophoretic deposition to pre-densify the semiconductor layer before subsequent electrochromic material deposition. This preliminary compression step ensures proper film density and structure, which improves contrast and response time while maintaining overall manufacturing simplicity through the addition of only one processing step.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables the production of flexible electrochromic devices with enhanced operational properties, including reduced side reactions, improved contrast, and faster response times, achieved through low-temperature processing without compromising the quality of the semiconductor layer.

Implementation Method 1

a semiconductor layer formed via electrophoretic deposition

Methodology Applied
Scientific EffectElectrophoretic deposition: Electrophoretic Deposition

Data Source

PatentUS7256925B2Flexible electrochromic device and method of manufacturing the same
Publication Date: 2007.08.14 SAMSUNG ELECTRONICS CO LTD
  • US7256925B2 patent drawing
  • US7256925B2 patent drawing
  • US7256925B2 patent drawing

AI summary

A flexible electrochromic device including a flexible transparent electrode including a predetermined pattern, an insulating layer formed on a portion of the transparent electrode other than the predetermined pattern, a semiconductor layer formed on the predetermined pattern, an electrochromic monolayer formed on the semiconductor layer, a flexible counter electrode disposed to face the transparent electrode and an electrolyte provided in a space between the transparent electrode and the counter electrode.