Flexible Upper Electrode Gap Control for Uniform Plasma Density
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in uniformly adjusting plasma density distribution in the radial direction within a processing container, leading to non-uniformity in plasma processing.
Innovation Solution
A plasma processing apparatus is designed with a flexible upper electrode and a dielectric plate, where the upper electrode is positioned above the dielectric plate to create a gap, and a driving shaft is used to adjust the gap length vertically, allowing for precise control of the electric field intensity and plasma density distribution by moving the upper electrode along the central axial line, thereby adjusting the plasma density distribution radially.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a rigid electrode structure is used, then the structural stability is good, but the plasma density distribution cannot be adjusted in the radial direction
Solution Approach 1:
The upper electrode is designed with flexibility to enable dynamic adjustment of the gap length between the upper electrode and dielectric plate. This flexibility allows the electrode structure to adapt its shape and position, enabling plasma density distribution adjustment in the radial direction while maintaining structural integrity through the driving shaft and actuator mechanism.
Solution Approach 2:
The gap length between the upper electrode and dielectric plate is made variable through the driving shaft and actuator system. By changing the gap length parameter dynamically, the plasma density distribution can be adjusted in the radial direction, transforming a static structure into a controllable system that achieves uniform plasma processing.
2Manufacturing precision
If the gap length between upper electrode and dielectric plate is fixed, then the device structure is simple, but the plasma density distribution cannot be controlled
Solution Approach 1:
The gap length is transformed from a fixed parameter to a dynamically adjustable parameter through the driving shaft and actuator mechanism. This allows the system to adapt the gap length according to processing requirements, enabling precise control of plasma density distribution while maintaining relatively simple operational procedures.
Solution Approach 2:
The manual adjustment mechanism is replaced with an automated actuator system that controls the driving shaft to adjust the gap length. This substitution of mechanical control systems enables precise and repeatable adjustment of plasma density distribution without requiring complex manual operations.
3Manufacturing precision
If the upper electrode is made flexible, then the plasma density distribution can be adjusted, but the structural stability may be reduced
Solution Approach 1:
The upper electrode incorporates flexibility through its structural design, allowing it to deform and adjust its position relative to the dielectric plate. This dynamic capability enables radial adjustment of plasma density distribution while the overall support structure maintains sufficient stability for precise control.
Solution Approach 2:
The driving shaft acts as an intermediary mechanical element that transmits control forces to the flexible upper electrode. This intermediary mechanism allows precise control of the electrode's position and shape, maintaining structural stability during adjustment operations while enabling plasma density distribution control.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enables the adjustment of plasma density distribution in the radial direction, reducing non-uniformity and improving the uniformity of plasma processing, ensuring consistent treatment of substrates.
Implementation Method 1
The upper electrode and the dielectric plate are configured to provide a gap therebetween
Implementation Method 2
The antenna and the radiation port supply radio frequency waves of the very high frequency (VHF) band or the ultra-high frequency (UHF) band into the process chamber
Implementation Method 3
adjustment of plasma density distribution in the radial direction... control of the electric field intensity and plasma density distribution
Implementation Method 4
The actuator is configured to move the driving shaft in the vertical direction
Data Source
AI summary
A plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, a dielectric plate, an upper electrode, an introduction part, a driving shaft, and an actuator. The stage is provided in the processing container. The dielectric plate is provided above the stage via a space in the processing container. The upper electrode has flexibility, is provided above the dielectric plate, and provides a gap between the dielectric plate and the upper electrode. The introduction part is an introduction part of radio frequency waves that are VHF waves or UHF waves, is provided at a horizontal end portion of the space. The driving shaft is coupled to the upper electrode on a central axial line of the processing container. The actuator is configured to move the driving shaft in a vertical direction.