Flexible Imprint Mold for Wire Grid Polarizer Alignment

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Solution Overview

Problem

In imprint methods using molds with no flexibility, achieving uniform resin layer thickness and preventing pattern deformation during separation is challenging, especially when increasing the mold's surface area, which affects the precision of wire grid polarizer alignment and photo-alignment processing.

Innovation Solution

An imprint mold with flexibility, featuring a main pattern region and a measurement pattern region on the same surface, where both patterns have the same line direction and width, and the measurement pattern is positioned close to the main pattern to facilitate precise alignment and reduce deformation during roller imprinting.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a mold with no flexibility is used to maintain parallel alignment and uniform resin layer thickness, then manufacturing precision is improved, but the mold surface area is limited due to strong peeling stress during separation

Engineering Contradiction:
Improveuniform resin layer thicknessVSAvoidmold surface area
Core Design Contradiction:
Manufacturing precisionVSArea of stationary object

Solution Approach 1:

The patent applies the dynamics principle by transitioning from a rigid mold to a flexible mold that can dynamically adapt its shape. The flexible mold can deform during the imprinting process to maintain contact with the resin layer, and then elastically recover during separation to reduce peeling stress. This dynamic behavior allows the mold to maintain manufacturing precision while enabling larger surface areas.

Inventive Principle:
Principle #15Dynamics

Solution Approach 2:

The patent directly applies the flexible shells and thin films principle by using a flexible mold instead of a rigid one. The flexible mold can conform to the resin layer during imprinting, ensuring uniform thickness, and its flexibility allows for easier separation from large-area patterns without causing defects, thereby resolving the contradiction between manufacturing precision and mold surface area.

Inventive Principle:
Principle #30Flexible shells and thin films

2Area of stationary object

If a roller imprint method is used to increase mold surface area, then the mold area is improved, but pattern deformation occurs during contact with resin composition

Engineering Contradiction:
Improvemold surface areaVSAvoidpattern deformation
Core Design Contradiction:
Area of stationary objectVSManufacturing precision

Solution Approach 1:

The flexible mold conforms to the resin layer during roller imprinting, distributing contact pressure uniformly and preventing pattern deformation. The flexibility allows the mold to adapt to the resin's surface topology, ensuring that large-area patterns are transferred accurately without distortion, thus resolving the contradiction between mold surface area and manufacturing precision.

Inventive Principle:
Principle #30Flexible shells and thin films

Solution Approach 2:

The flexible mold dynamically adjusts its shape during roller contact, allowing it to follow the resin layer's surface profile. This dynamic adaptation prevents pattern deformation while enabling large surface area imprinting, as the mold can flexibly accommodate variations in the resin layer thickness and surface topology.

Inventive Principle:
Principle #15Dynamics

3Ease of operation

If measurement pattern is disposed outside main pattern region to avoid photo-alignment issues, then photo-alignment processing is improved, but positional alignment accuracy deteriorates due to increased distance

Engineering Contradiction:
Improvephoto-alignment processingVSAvoidpositional alignment accuracy
Core Design Contradiction:
Ease of operationVSManufacturing precision

Solution Approach 1:

The patent applies local quality by creating a measurement pattern region with specific local characteristics that differ from the main pattern region. The measurement pattern is designed with local features optimized for alignment detection, while maintaining close proximity to the main pattern. This local differentiation enables accurate photo-alignment processing without sacrificing positional alignment accuracy, as the measurement pattern can be specifically tailored for its measurement function while remaining spatially close to the main pattern.

Inventive Principle:
Principle #3Local quality

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for high-precision alignment of wire grid polarizers, reduces pattern deformation, and enhances photo-alignment processing by ensuring accurate positional alignment and minimizing defects in the roller imprint method.

Implementation Method 1

contact the resin composition by pressing the rear surface of the mold (surface on which the relief structure is not formed) using a roller

Methodology Applied
Scientific EffectMechanical pressure: Pressure Increase

Implementation Method 2

substrate having flexibility

Methodology Applied
Scientific EffectElasticity: Elasticity

Data Source

PatentUS10088617B2Imprint mold, imprint method, wire grid polarizer, and method for manufacturing wire grid polarizer
Publication Date: 2018.10.02 DAI NIPPON PRINTING CO LTD
  • US10088617B2 patent drawing
  • US10088617B2 patent drawing
  • US10088617B2 patent drawing

AI summary

A configuration including a main pattern region and a measurement pattern region which are set on one surface of a substrate having flexibility, wherein the measurement pattern region has at least a region disposed inside the contour line of the main pattern region, a main pattern, in which a plurality of line-shaped main convex patterns are arrayed with desired intervals, is disposed in the main pattern region, a measurement pattern, in which a plurality of line-shaped unit convex patterns are arrayed with desired intervals, is disposed in the measurement pattern region, and the line direction of the main pattern and the line direction of the measurement pattern are the same.