Flexible Mask Nano-Structure Patterning on Non-Flat Surfaces
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Solution Overview
Problem
Existing methods for patterning non-flat surfaces with nano or micro-sized structures are costly, have limited mechanical, chemical, and thermal resistance, and struggle with dimensional accuracy, especially on complex shapes, due to difficulties in focusing light and removing residual materials during lithography processes.
Innovation Solution
A method involving the creation of a flexible mask with nano or micro structures, chemical activation to enhance bonding, and covalent bonding with the tool surface, using an anti-activation mask to prevent unwanted bonding, followed by etching to achieve durable and dimensionally accurate patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional lithography processes are used to pattern non-flat surfaces, then patterning can be achieved, but the process becomes costly and difficult to implement accurately due to difficulty in focusing light on non-flat surfaces
Solution Approach 1:
The patent uses a flexible mask that copies the master pattern onto the non-flat tool surface. The flexible mask is first patterned on a flat master, then conformally transferred to the curved surface, allowing accurate pattern reproduction without requiring focused light on non-flat surfaces. This resolves the contradiction by enabling precise patterning through mechanical copying rather than optical focusing.
Solution Approach 2:
The patent employs a flexible mask made of elastomeric material that can conform to non-flat surfaces. The flexible mask is patterned on a flat substrate, then elastically deformed and transferred to the curved tool surface, maintaining pattern integrity. This flexibility allows the mask to adapt to any surface geometry, solving the focusing problem while maintaining manufacturing cost-effectiveness.
2Shape
If a flexible slave tool is used to transfer patterns to non-flat surfaces, then patterning of curved surfaces is achieved, but the deposited material lacks high mechanical, chemical or thermal resistance
Solution Approach 1:
The patent uses a composite structure where the flexible mask material is combined with a hardenable coating material. The flexible mask provides the pattern transfer capability, while the hardenable coating (such as ceramic or metal layers) provides the required mechanical, chemical, and thermal resistance. This composite approach resolves the contradiction by combining the advantages of both flexible patterning and durable material properties.
Solution Approach 2:
The patent changes the physical and chemical parameters of the coating material through controlled hardening processes. The coating is applied in a soft state for easy transfer, then undergoes thermal or chemical treatment to transform into a hard, resistant state. This parameter transformation allows the material to provide high resistance while maintaining the ability to conform to complex geometries.
3Manufacturing precision
If conventional imprinting processes are used, then patterns can be transferred to tool surfaces, but dimensional accuracy is limited due to overflow of masking materials during the imprinting process
Solution Approach 1:
The patent segments the patterning process into distinct stages: first pattern formation on the flexible mask, then transfer to the tool surface, and finally hardening. This segmentation allows precise control at each stage, preventing material overflow during transfer while maintaining dimensional accuracy. The flexible mask acts as a self-contained pattern carrier that prevents material migration.
Solution Approach 2:
The flexible mask serves as an intermediary between the master pattern and the tool surface. It transfers the pattern without direct contact between the master and tool, preventing material overflow and maintaining dimensional accuracy. The flexible mask's elasticity allows it to conform to the tool surface while preserving pattern integrity, solving the overflow problem.
4Adaptability or versatility
If masks are deposited directly onto molding die surfaces for lithography, then patterning can be performed, but it is costly and limits the shapes the die may adopt
Solution Approach 1:
The patent uses a dynamic, flexible mask that can adapt to any die shape. The flexible mask is elastically deformed to conform to the specific geometry of the tool surface, allowing the same patterning process to be applied to various die shapes without requiring shape-specific masks. This dynamic adaptation resolves the contradiction by providing versatility while maintaining cost-effectiveness through a single flexible mask system.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method allows for cost-effective, high-accuracy patterning of non-flat surfaces with nano or micro structures, providing durable tools with improved mechanical, chemical, and thermal resistance, and enabling quick production of complex patterns with well-defined edges and surfaces.
Implementation Method 1
chemical activation to enhance bonding
Implementation Method 2
promoting a covalent bonding reaction between said patterned surface of the flexible mask in contact with said surface to be patterned
Data Source
Figure 1A~1D
Figure 1E~1G
Figure 2
AI summary
Method of patterning a surface of an object or a tool with nano and/or micro structure elements having dimensions in a range of 1 nanometer to 1 millimeter, comprising the steps of producing a flexible mask with said nano or micro structure pattern formed on a surface of said flexible mask, chemically activating said surface of the flexible mask and/or said surface to be patterned of the tool, placing said patterned surface of the flexible mask in contact with said surface to be patterned of the object or tool, promoting a covalent bonding reaction between said patterned surface of the flexible mask in contact with said surface to be patterned, removing the flexible mask from the tool whereby a layer of said flexible mask remains bonded to said surface to be patterned of the tool, etching said surface to be patterned of the tool whereby the bonded layer of flexible mask material resists etching. An anti-activation mask defining a periphery of the surface area to be patterned, or peripheries of the surface area to be patterned if there are a plurality of separate portions of surface area to be patterned, is deposited on the flexible mask prior to placing the patterned surface of the flexible mask on the surface to be patterned. The anti-activation mask prevents bonding of the flexible mask to the surface of the object or tool in areas where the anti-activation mask is present.