Flexible Substrate Remounting for Scalable CVD Processing
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Solution Overview
Problem
Current CVD systems face challenges in scaling up the production of high-quality nano-structured materials on flexible substrates due to the lack of economical solutions, with roll-to-roll systems requiring costly hardware changes and increased development risks, making it difficult for smaller companies to commercialize large area CVD processed films and nano-structured materials.
Innovation Solution
A substrate remounting method that allows flexible substrates to be processed in a batch CVD system by unrolling and re-rolling them into an Archimedes spiral with gas porous strips for uniform gas exchange, enabling processing of longer substrates within existing CVD systems without significant hardware changes, and allowing for similar process recipes across different substrate sizes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Productivity
If roll-to-roll CVD systems are used to increase productivity and reduce large area production costs, then processing speed and area are improved, but hardware complexity and development costs increase significantly
Solution Approach 1:
The patent applies dynamics by making the substrate holder rotatable, allowing the flexible substrate to be dynamically repositioned from a horizontal loading position to a vertical processing position. This dynamic adjustment enables a standard batch CVD system to process long flexible substrates without requiring complex roll-to-roll hardware, thus improving productivity while avoiding increased device complexity.
2Area of stationary object
If the length of flexible substrate is increased to process larger areas in batch CVD systems, then production area is improved, but the substrate cannot fit within the existing reactor chamber dimensions
Solution Approach 1:
The patent applies dimensionality change by rotating the substrate from a horizontal orientation to a vertical orientation within the reactor chamber. This allows the long flexible substrate (e.g., 100 inches) to fit within the existing chamber by utilizing the vertical dimension, thereby increasing the processing area without requiring a larger reactor chamber.
3Manufacturing precision
If process conditions are optimized for batch CVD systems with flat substrates, then material quality is improved, but the same conditions cannot be directly applied to roll-to-roll systems
Solution Approach 1:
The patent applies universality by enabling a standard batch CVD system to perform multiple functions: it can process both traditional flat substrates and long flexible substrates using the same optimized process conditions. The rotatable holder and vertical positioning allow the system to maintain the beneficial batch processing conditions while accommodating different substrate formats, making the process portable and adaptable without requiring separate system optimizations.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This method enables the efficient and cost-effective scaling up of CVD processing for flexible substrates, allowing for the growth of nano-structured materials on larger areas with reduced production and development costs, and is adaptable to various CVD processing needs, including both hot wall and cold wall processing.
Implementation Method 1
gas porous strips that provide both a constant spacing function and the process gas exchange between the inner and other regions of such remounted substrate roll
Implementation Method 2
chemical vapor deposition (CVD) systems and CVD synthesis used to synthesize at least one layer or to grow at least one nano-structured material on at least one surface of a flexible substrate
Data Source
AI summary
The present invention relates to tools and system designs for chemical vapor deposition (CVD) systems and CVD synthesis used to deposit one or more thin film layers onto a flexible substrate or to grow nano-structured materials on large area flexible substrates and, more particularly, to scalable CVD coating and nanostructure manufacturing including CVD thin films and nano-structured materials such as nanotubes, nanowires and nanosheets.