Floating Target Assembly Biasing for Vacuum Seals
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Solution Overview
Problem
In physical vapor deposition (PVD) chambers, a poor vacuum seal between the chamber lid and body due to insufficient contact between non-vacuum and vacuum regions leads to diminished substrate processing and arcing between surfaces.
Innovation Solution
The implementation of biasing elements and insulators between the target assembly and grounding assembly to compress gaps and enhance vacuum seals, ensuring stronger vacuum forces and reduced arcing by improving surface contact between the chamber lid and body.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of operation
If the chamber lid is removed for cleaning or maintenance, then accessibility for maintenance is improved, but vacuum seal reliability deteriorates due to potential poor contact between adjacent surfaces
Solution Approach 1:
The biasing elements are pre-installed between the chamber lid and chamber body to automatically apply compressive force ensuring proper contact and vacuum seal when the chamber lid is installed, eliminating the need for manual adjustment and ensuring reliable sealing before operation begins
Solution Approach 2:
The biasing elements automatically maintain the vacuum seal through their inherent elastic or mechanical biasing force, providing self-regulating contact pressure that ensures proper sealing without requiring external intervention or adjustment during operation
2Reliability
If sufficient vacuum force is applied to ensure good contact between chamber lid and body, then vacuum seal reliability is improved, but device complexity increases due to additional biasing mechanisms
Solution Approach 1:
The vacuum seal system is divided into discrete biasing elements positioned at specific locations between the chamber lid and chamber body, allowing independent adjustment and maintenance of each sealing point without affecting the entire system
Solution Approach 2:
Biasing elements serve as intermediary components between the chamber lid and chamber body, providing the necessary compressive force to ensure proper contact and vacuum sealing without requiring complex mechanical linkages or adjustment mechanisms
3Device complexity
If adjacent surfaces of chamber lid and body are in poor contact, then device simplicity is maintained, but harmful effects increase due to arcing between surfaces
Solution Approach 1:
The biasing elements convert the potential harm of insufficient contact pressure into beneficial continuous contact, ensuring that the surfaces remain properly sealed and eliminating arcing conditions through maintained electrical continuity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This solution achieves improved vacuum conditions and reduced arcing within the process chamber, enhancing substrate processing efficiency.
Implementation Method 1
one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member
Data Source
AI summary
Substrate processing systems are provided herein. In some embodiments, a substrate processing system may include a target assembly having a target comprising a source material to be deposited on a substrate; a grounding assembly disposed about the target assembly and having a first surface that is generally parallel to and opposite a backside of the target assembly; a support member coupled to the grounding assembly to support the target assembly within the grounding assembly; one or more insulators disposed between the backside of the target assembly and the first surface of the grounding assembly; and one or more biasing elements disposed between the first surface of the grounding assembly and the backside of the target assembly to bias the target assembly toward the support member.