Variable-Height Flow Control Ring for Uniform Exhaust Bias

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Solution Overview

Problem

In semiconductor manufacturing, non-uniform exhaust gas flow can negatively impact the thickness uniformity of films on wafers.

Innovation Solution

A flow control ring with variable section heights is introduced between the exhaust plate and the reaction chamber, featuring sections with differing heights and tapered profiles to manage gas flow uniformly.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Manufacturing precision

If a uniform flow control ring is used, then the structure is simple, but the exhaust gas flow becomes non-uniform impacting film thickness uniformity

Engineering Contradiction:
Improvefilm thickness uniformityVSAvoidflow control ring structure
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The flow control ring incorporates sections with different heights (first section has height H1, second section has height H2 where H1 ≠ H2) to create localized variations in flow resistance. This local quality differentiation compensates for the non-uniform exhaust gas flow patterns, ensuring uniform film thickness across the wafer surface without requiring complex external control systems

Inventive Principle:
Principle #3Local quality

2Productivity

If the exhaust port and gate valve are positioned to facilitate gas removal, then exhaust efficiency is improved, but flow bias is created that negatively impacts uniformity

Engineering Contradiction:
Improveexhaust efficiencyVSAvoidfilm thickness uniformity
Core Design Contradiction:
ProductivityVSManufacturing precision

Solution Approach 1:

The flow control ring is designed with predetermined height variations that pre-compensate for the flow biases introduced by the exhaust port and gate valve positioning. By anticipating the non-uniform flow patterns created by these components, the varying section heights create opposing flow resistance variations that balance the overall flow distribution, maintaining uniformity while preserving exhaust efficiency

Inventive Principle:
Principle #9Preliminary anti-action

Data Source

PatentUS20260002258A1Methods and apparatus for exhaust bias
Publication Date: 2026.01.01 ASM IP HLDG BV
  • US20260002258A1 patent drawing
  • US20260002258A1 patent drawing
  • US20260002258A1 patent drawing

AI summary

Various embodiments of the present technology may provide a flow control ring disposed between an exhaust plate and a reaction chamber, the flow control ring including a plurality of sections, wherein the plurality of sections consists of a first quarter section, a second quarter section, a third quarter section, and a fourth quarter section, and wherein the second, third, and fourth sections have a first height and the first section has a second height that is greater than the first height.