Flow Controlled Liner with Spatially Distributed Gas Passages
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Solution Overview
Problem
Conventional semiconductor process chambers experience non-uniform gas distribution, which affects the uniformity of substrate processing, especially at elevated temperatures, despite continuous substrate rotation.
Innovation Solution
A liner assembly with a ring-shaped body and multiple gas passages is introduced to connect the outer surface to the substrate processing volume, allowing for tunable gas flow parameters such as velocity, density, direction, and spatial location, minimizing pressure drop and preventing gas mixing before reaching the substrate.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional gas distribution methods are used in process chambers, then gas can be supplied to the chamber, but gas distribution is not uniform across the entire process area
Solution Approach 1:
The gas distribution system is segmented into multiple independent gas injectors positioned at different locations within the chamber. Each injector can be controlled independently to deliver gas to specific regions, allowing precise control over gas distribution patterns across the substrate surface.
Solution Approach 2:
Different regions of the chamber are provided with tailored gas distribution characteristics through strategically positioned gas injectors. Each injector is configured to deliver appropriate gas flow rates and compositions to specific local areas, ensuring optimal gas distribution uniformity across the entire process area.
2Manufacturing precision
If substrate rotation is used to reduce non-uniformity of gas distribution, then some uniformity improvement is achieved, but rotation alone is not enough as the requirement for uniformity increases
Solution Approach 1:
Instead of relying solely on substrate rotation, the gas distribution system is segmented into multiple fixed gas injectors positioned at optimized locations. This segmentation allows each injector to target specific regions, achieving uniform gas distribution without requiring complex rotation mechanisms.
Solution Approach 2:
The system provides dynamic control over gas distribution by independently adjusting the flow rates and timing of multiple gas injectors. This dynamic adjustment capability allows the system to adapt to different process requirements and achieve uniform distribution without mechanical rotation.
3Manufacturing precision
If gas is supplied from a single gas inlet, then gas can be introduced to the chamber, but gas distribution near the gas inlet is different from gas distribution near the pumping port
Solution Approach 1:
The single gas inlet is replaced with multiple gas injectors distributed throughout the chamber. Each injector serves a specific region, segmenting the gas distribution function to eliminate the gradient between inlet and pumping port areas.
Solution Approach 2:
Multiple gas injectors are designed with universal mounting and control characteristics, allowing them to perform the same gas delivery function at different locations. This multi-functional approach achieves uniform distribution without proportionally increasing system complexity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution achieves improved gas flow uniformity across the substrate, reducing pressure drop and allowing tailored gas distribution, thereby enhancing the uniformity of substrate processing and preventing gas mixing, leading to more efficient processing.
Implementation Method 1
a plurality of gas passages connecting the outer surface to the substrate processing volume
Implementation Method 2
directing radiant energy from a plurality of heating elements towards an enclose of a substrate process chamber
Data Source
AI summary
Embodiments of the present disclosure provide a liner assembly including a plurality of individually separated gas passages. The liner assembly enables tenability of flow parameters, such as velocity, density, direction and spatial location, across a substrate being processed. The processing gas across the substrate being processed may be specially tailored for individual processes with a liner assembly according to embodiment of the present disclosure.