Flow Guide Tube Reaction Chamber for Uniform Wafer Oxidation
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Solution Overview
Problem
In semiconductor technology, the oxidation process of wafers using microwave plasma often results in uneven plasma distribution, leading to reduced concentration of oxygen free radicals on the wafer surface, which in turn affects the growth rate and quality of silicon dioxide.
Innovation Solution
A reaction chamber with a flow guide tube is designed to converge plasma from an opening to the top surface of the wafer, ensuring higher plasma concentration and reducing diffusion to areas outside the wafer, thereby enhancing the growth rate and quality of silicon dioxide.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If plasma is transported into the chamber body through the opening without a flow guide tube, then the plasma can enter the chamber body, but the plasma diffuses to areas outside the wafer top surface, reducing plasma concentration on the wafer surface
Solution Approach 1:
The flow guide tube acts as an intermediary component between the plasma source and the wafer surface. It guides and directs the plasma flow along its internal passage, ensuring the plasma reaches the intended target area (wafer top surface) without diffusing to surrounding areas, thus preventing plasma loss and maintaining high plasma concentration at the reaction zone.
Solution Approach 2:
The flow guide tube creates a localized plasma delivery system where the plasma is concentrated and directed precisely to the wafer top surface. The tube structure ensures that plasma properties (concentration, direction) are optimized locally at the wafer surface rather than being dispersed throughout the entire chamber body.
2Productivity
If the flow guide tube is arranged between the opening and the wafer stage, then the plasma concentration on the wafer surface increases, but the device complexity increases due to the additional tube structure
Solution Approach 1:
The flow guide tube is designed as a segmented structure with distinct components: a tube body with a gas inlet at one end and a gas outlet at the other end. This segmentation allows for modular assembly, easier manufacturing, and simplified maintenance while achieving the complex function of plasma guidance and concentration.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution increases the plasma concentration on the wafer surface, improving the growth rate and quality of silicon dioxide films by directly guiding plasma to the wafer surface, reducing plasma loss and ensuring uniform coverage.
Implementation Method 1
the gas mixture (microwave plasma) of oxygen and hydrogen is dissociated into a plasma rich in oxygen free radicals through a microwave plasma source
Implementation Method 2
a gas outlet at other end of the tube body extends toward the reaction area and is used to transport the plasma to the top surface of the reaction area
Data Source
AI summary
Provided is a reaction chamber and an oxidation device. The reaction chamber includes a chamber body and a flow guide tube. The chamber body is provided with a wafer stage inside, the wafer stage forms a reaction area for accommodating a wafer, a top surface of the reaction area is not lower than a top surface of the wafer, and a side wall of the chamber body is provided with an opening. The flow guide tube is arranged inside the chamber body, the flow guide tube comprises a tube body, a gas inlet of the tube body is communicated with the opening, and a gas outlet of the tube body extends toward the reaction area and is used to transport the plasma to the top surface of the reaction area.