Flow Restrictor Seal with Interference Fit for Gas Leakage Control
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Semiconductor fabrication processes require more accurate and consistent gas flow control with reduced equipment costs and improved transient response times, which existing flow restrictor seals fail to achieve effectively.
Innovation Solution
A seal for a flow restrictor with a specific design featuring a sealing portion and ridges for enhanced retention and an interference fit to minimize gas leakage, allowing precise fluid-tight connections and accommodating various valve geometries and sizes.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional seals are used in flow restrictors, then manufacturing costs are reduced, but gas leakage increases and flow control accuracy deteriorates
Solution Approach 1:
The seal is divided into multiple functional segments: a first sealing surface for contacting the flow restrictor, a second sealing surface for contacting the valve passage, and retention ridges that segment the sealing interfaces. This segmentation allows each surface to be optimized for its specific function, achieving high sealing accuracy while maintaining manufacturing simplicity through modular design.
Solution Approach 2:
Different regions of the seal are given different geometric properties: the first sealing surface has a specific diameter matching the flow restrictor, the second sealing surface contacts the valve passage, and retention ridges are positioned at specific locations. This local differentiation of geometric quality ensures optimal sealing performance at each interface without requiring complex manufacturing throughout the entire component.
2Productivity
If existing flow restrictor seals are used, then device complexity is minimized, but transient response time increases and consistency deteriorates
Solution Approach 1:
The seal design incorporates retention ridges that dynamically engage with the flow restrictor during assembly, ensuring immediate and consistent sealing contact. The geometric configuration of the sealing surfaces is optimized for rapid gas flow establishment, reducing transient response time while maintaining a relatively simple overall structure that does not significantly increase device complexity.
3Ease of manufacture
If simple seal designs are used, then manufacturing costs are reduced, but gas leakage increases
Solution Approach 1:
The seal acts as an intermediary component between the flow restrictor and the valve passage, providing dedicated sealing surfaces that mediate the interface between these two components. The retention ridges serve as intermediary features that ensure proper positioning and contact, achieving effective gas leakage prevention through this intermediary sealing structure while maintaining manufacturing simplicity.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The seal ensures negligible gas leakage, achieving a leak rate of less than 1×10−7 atm-cc/sec and reliable gas flow control with reduced costs, meeting the demands of modern semiconductor processes.
Implementation Method 1
an interference fit to minimize gas leakage
Data Source
AI summary
Apparatuses for controlling gas flow are important components for delivering process gases for semiconductor fabrication. These apparatuses for controlling gas flow frequently rely on effectively sealed flow restrictors which can eliminate leakage of process gas around the flow restrictors. In one embodiment, a seal for a flow restrictor is disclosed, the seal comprising a plastic cylinder which is shrink fit onto a sealing portion of the flow restrictor. In another embodiment, a seal for a flow restrictor is disclosed, the seal having a first sealing ring with a flow aperture, a flow restrictor installed into the flow aperture.