Flow Through Line Charge Volume Gas Purging
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Solution Overview
Problem
Semiconductor processing equipment faces inefficiencies in delivering precise gas bursts due to measurement errors and ineffective purging in traditional line charge volume designs, particularly with surface mount integrated gas systems, which lead to recirculation and prolonged purge times.
Innovation Solution
The integration of an internal tube within the charge volume extends the gas input away from the output, enabling efficient flow-through purging and accurate pressure measurement through a capacitance diaphragm gauge directly connected to the chamber, improving dynamic performance and purging efficiency.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Measurement precision
If a surface mount integrated gas system with tandem charge volume and capacitance diaphragm gauge is used, then pressure measurement capability is provided, but measurement errors occur due to mass flow difference between charge volume and gauge
Solution Approach 1:
The patent combines the charge volume and capacitance diaphragm gauge into a single integrated chamber, eliminating the tandem arrangement that caused measurement errors. The gauge is positioned to directly measure pressure within the charge volume without interference from mass flow differences, resolving the contradiction between providing pressure measurement capability and ensuring measurement reliability.
2Device complexity
If a single-ended volume design is used, then device complexity is reduced, but purging efficiency deteriorates due to dead leg formation and recirculation
Solution Approach 1:
The patent segments the single-ended volume into multiple regions using internal baffle structures. These baffles create distinct flow paths that prevent dead leg formation and recirculation, allowing efficient purging while maintaining a relatively simple overall device structure. The segmentation enables effective gas flow management without significantly increasing device complexity.
3Volume of moving object
If inlet and outlet ports are positioned close together, then device dimensions are reduced, but purging effectiveness deteriorates due to significant recirculation
Solution Approach 1:
The patent introduces internal baffle structures that create three-dimensional flow paths within the compact charge volume. These baffles redirect gas flow to eliminate recirculation patterns that would otherwise occur in small-volume designs with close inlet/outlet ports, maintaining compact dimensions while achieving effective purging through enhanced flow management in multiple spatial dimensions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This configuration enhances the dynamic performance of gas delivery systems by effectively purging residual gases and providing accurate pressure measurements, reducing measurement delays and purge times, while maintaining high discharge speed and conductance.
Implementation Method 1
a capacitance diaphragm gauge (CDG) 124 is provided in tandem to define the LCV 102
Implementation Method 2
the pressure reading, Pg, incurs a measurement error, where Pg=Pv−(m/C)
Implementation Method 3
In flow-through purging, the viscosity of the gas can be used to literally push residual ambient out of the charge volume
Data Source
AI summary
A charge volume configuration for use in delivery of gas to a reactor for processing semiconductor wafers is provided. A charge volume includes a chamber that extends between a proximal end and a distal end. A base connected to the proximal end of the chamber, and the base includes an inlet port and an outlet port. A tube is disposed within the chamber. The tube has a tube diameter that is less than a chamber diameter. The tube has a connection end coupled to the inlet port at the proximal end of the chamber and an output end disposed at the distal end of the chamber.