Fluid Nozzle Device for Semiconductor Substrate Cleaning

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Solution Overview

Problem

Conventional methods for cleaning semiconductor wafers or substrates, such as soaking in chemical agents, are inefficient and complicate waste disposal, leading to poor cleaning effects and potential defects.

Innovation Solution

A fluid nozzle device with a nozzle body, gas-intake tube, and liquid-intake tube, which uses a CO2-dissolved process liquid ejected through channels to effectively clean substrates by combining gas and liquid forces for improved cleaning efficiency.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If conventional soaking method in chemical agent is used, then the substrate can be cleaned, but the cleaning effect is poor and yield is adversely influenced

Engineering Contradiction:
Improvecleaning effectVSAvoidyield
Core Design Contradiction:
ReliabilityVSProductivity

Solution Approach 1:

The patent employs a fluid nozzle device that uses gas pressure to eject process liquid onto the substrate surface. Gas is introduced into a receiving space and urges the process liquid through ejecting channels, creating a high-velocity spray that effectively removes pollutants. This pneumatic-hydraulic mechanism replaces the ineffective soaking method with dynamic fluid ejection, significantly improving cleaning effect and subsequent yield.

Inventive Principle:
Principle #29Pneumatics and hydraulics

2Reliability

If conventional soaking method in chemical agent is used, then the substrate can be cleaned, but waste disposal becomes complicated

Engineering Contradiction:
Improvecleaning effectVSAvoidwaste disposal complexity
Core Design Contradiction:
ReliabilityVSDevice complexity

Solution Approach 1:

The patent changes the chemical parameters of the cleaning process by using a process liquid containing dissolved carbon dioxide instead of conventional chemical agents. This parameter change transforms the cleaning mechanism while simplifying waste disposal, as the CO2-containing process liquid can be more easily handled and disposed of compared to traditional chemical cleaning agents.

Inventive Principle:
Principle #35Parameter changes

3Productivity

If process liquid is ejected using gas pressure, then cleaning efficiency is improved, but device structure becomes more complex

Engineering Contradiction:
Improvecleaning efficiencyVSAvoidnozzle structure complexity
Core Design Contradiction:
ProductivityVSDevice complexity

Solution Approach 1:

The fluid nozzle device is segmented into distinct functional components: a nozzle body with a receiving space, a gas-intake tube for gas supply, a liquid-intake tube for process liquid supply, and multiple ejecting channels. This segmentation allows each component to perform its specific function efficiently while maintaining overall structural organization, making the complex device manageable and effective.

Inventive Principle:
Principle #1Segmentation

Solution Approach 2:

The gas-intake tube and liquid-intake tube are nested within or alongside the nozzle body structure, with the ejecting channels integrated into the nozzle body walls. The tubes are positioned to deliver their respective fluids into the receiving space, creating a compact nested arrangement that achieves high cleaning efficiency without excessive external complexity.

Inventive Principle:
Principle #7Nested doll (Nesting)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The fluid nozzle device enhances cleaning efficiency, reduces environmental pollution, and simplifies waste treatment by using deionized water and carbon dioxide, improving the impact force on substrates and yield while avoiding chemical agent disposal issues.

Implementation Method 1

dissolving carbon dioxide in a liquid to form a process liquid

Methodology Applied
Scientific EffectDissolution: Solvation

Implementation Method 2

a process liquid introduced from the liquid-intake tube flows out of the liquid-intake tube through the liquid outlet and is urged by a gas introduced into the receiving space through the gas-intake tube to eject out of the fluid nozzle to the substrate via the ejecting channels

Methodology Applied
Scientific EffectGas pressure: Pressure Increase

Data Source

PatentUS9737901B2Fluid nozzle device and method for cleaning a substrate using the same
Publication Date: 2017.08.22 ELS SYST TECH
  • US9737901B2 patent drawing
  • US9737901B2 patent drawing
  • US9737901B2 patent drawing

AI summary

A fluid nozzle device includes: at least one fluid nozzle which includes a nozzle body having a first inner surface, a second inner surface that is opposite to and spaced apart from the first inner surface, an inner bottom surface that interconnects the first and second inner surfaces and that cooperates with the first and second inner surfaces to define a receiving space thereamong; a gas-intake tube disposed on top of the nozzle body; a liquid-intake tube formed with a liquid inlet and having at least one liquid outlet that is distal from the gas-intake tube; and a plurality of ejecting channels spaced apart from each other and disposed in the nozzle body.