Fluorene-Based Resin Polymer for Photosensitive Compositions
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Solution Overview
Problem
Fluorene-based resin polymers with high molecular weight and low acid value are needed to improve developing properties and stability in photosensitive resin compositions, as existing polymers with high acid values face issues with pattern removal during development and stability in negative type photosensitive compositions.
Innovation Solution
A fluorene-based resin polymer with a specific repeating unit, synthesized through a method involving fluorene-based compounds and epoxy groups, is developed to maintain high molecular weight while minimizing acid value, ensuring excellent adhesive and developing properties and stability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If fluorene-based resin polymer with high molecular weight is used, then adhesive property and strength are improved, but acid value increases causing pattern removal during development
Solution Approach 1:
The patent changes the chemical structure parameters of the fluorene-based resin polymer by introducing specific substituents (alkylene groups with 1-3 carbon atoms, ethylene oxide groups, or propylene oxide groups) at positions X1-X4 and Z1-Z4. This structural modification allows the polymer to maintain high molecular weight for adhesive strength while the specific group composition controls the acid value to remain below 80 mg KOH/g, preventing pattern removal during development.
Solution Approach 2:
The patent creates a composite chemical structure within the fluorene-based resin polymer by combining the fluorene core structure with multiple types of functional groups (alkylene chains, ether groups from ethylene oxide or propylene oxide). This composite molecular architecture achieves both high molecular weight for strength and controlled acid value through the specific combination and ratio of these functional groups.
2Strength
If high molecular weight polymer is used, then coating strength is improved, but developing property deteriorates due to high acid value
Solution Approach 1:
The patent modifies the chemical parameters of the polymer by controlling the types and positions of substituents on the fluorene core. The alkylene groups (1-3 carbon atoms), ethylene oxide groups, and propylene oxide groups are strategically placed to increase molecular weight for coating strength while their specific chemical nature keeps the acid value low (<80 mg KOH/g), ensuring good developing property where the pattern remains intact during alkali development.
3Ease of manufacture
If existing fluorene-based resin is used, then coating ability is achieved, but stability in negative type photosensitive composition is poor
Solution Approach 1:
The patent changes the chemical composition parameters of the fluorene-based resin by incorporating specific functional groups (ethylene oxide and propylene oxide groups) that provide both coating ability and stability. These groups modify the polymer's chemical reactivity and physical properties, enabling it to function as a stable binder in negative type photosensitive compositions while maintaining good coating performance.
Solution Approach 2:
The patent creates a composite molecular structure combining the fluorene core with ether-containing side chains (ethylene oxide or propylene oxide groups). This composite structure provides dual functionality: the fluorene core ensures photosensitivity and the ether groups provide chemical stability and coating ability, making the polymer suitable for negative type photosensitive compositions.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resulting fluorene-based resin polymer exhibits improved developing properties, reduced pattern removal during development, and enhanced stability in photosensitive resin compositions, maintaining high molecular weight with a low acid value, suitable for negative type photosensitive applications.
Implementation Method 1
A photosensitive resin composition may be polymerized and cured by irradiating light
Data Source
AI summary
The present invention relates to a fluorene-based resin polymer, and a photosensitive resin composition including the same, and the fluorene-based resin polymer according to the exemplary embodiment of the present invention has a high molecular weight, a low acid value, and excellent developing property, adhesive property and stability.