Resist Composition with Fluorinated Alicyclic Resin for High Resolution Etching
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Solution Overview
Problem
Current resist compositions face challenges in achieving high resolution and dry-etching tolerance due to limitations in the structural units used in resins, particularly in photolithography processes, where the existing materials do not adequately combine the necessary properties for precise pattern formation and etching resistance.
Innovation Solution
A resist composition is developed that includes a resin with a structural unit derived from a specific compound having a fluorinated alkyl group and an alicyclic hydrocarbon group, combined with an acid-labile group and an acid generator, which is applied to a substrate, exposed, heated, and developed to form a resist pattern, enhancing resolution and etching tolerance.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition materials are used, then the basic resist function is achieved, but high resolution and dry-etching tolerance cannot be simultaneously achieved
Solution Approach 1:
The patent employs a composite resin system combining polycyclic structures (for etching tolerance) with fluorinated groups and aromatic hydrocarbon groups (for resolution enhancement). This multi-component molecular architecture allows simultaneous optimization of both resolution and dry-etching tolerance by integrating complementary functional groups within the same polymer structure.
Solution Approach 2:
The resist composition introduces specific functional groups (fluorinated groups, aromatic hydrocarbon groups) at targeted positions within the resin molecules. These localized structural modifications create regions with enhanced properties: fluorinated groups improve resolution by controlling refractive index and chain flexibility, while aromatic hydrocarbon groups enhance etching tolerance through rigid structural support.
2Manufacturing precision
If resin structural units are optimized for high resolution, then pattern formation precision improves, but dry-etching tolerance deteriorates
Solution Approach 1:
The patent merges previously separate functional requirements into a unified resin structure. The polycyclic backbone provides etching resistance while side chains containing fluorinated and aromatic groups simultaneously deliver high-resolution patterning. This consolidation eliminates the need to choose between resolution optimization and etching tolerance.
Solution Approach 2:
The patent systematically adjusts molecular parameters including fluorine content (0.1-10 mmol/g), aromatic hydrocarbon group content (0.1-10 mmol/g), and polycyclic structure configuration to simultaneously optimize resolution and etching tolerance. By controlling these compositional parameters within specific ranges, both performance metrics are enhanced without compromise.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The proposed resist composition improves the resolution and dry-etching tolerance of the resist patterns, enabling more precise photolithography results by leveraging the unique properties of the fluorinated and alicyclic components in the resin.
Implementation Method 1
a resin having an acid-libile group and an acid generator
Implementation Method 2
heating the exposed composition layer, and developing the heated composition layer
Data Source
AI summary
A compound having a group represented by the formula (Ia):wherein R1 represents a C1 to C8 fluorinated alkyl group, R2 represents a group having an optionally substituted C5 to C18 alicyclic hydrocarbon group, and * represents a binding site.