Fluorinated Copolymer Sealing Material for Semiconductor Equipment
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing crosslinkable fluorinated copolymer compositions face challenges in controlling crosslinkability and producing fewer particles during plasma irradiation in semiconductor production equipment, leading to compromised cleanability and mechanical properties.
Innovation Solution
A crosslinkable composition comprising a copolymer with iodine atoms, tetrafluoroethylene, and propylene units, combined with organic peroxide, crosslinking aids, and quaternary ammonium or phosphonium salts, with controlled metal content, to enhance crosslinkability and reduce particle production.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a peroxide or organic onium compound is blended in a fluorinated copolymer to accelerate crosslinking reaction, then crosslinkability is improved, but controlling crosslinkability becomes difficult
Solution Approach 1:
The invention changes the chemical structure parameter of the copolymer by limiting vinylidene fluoride content to less than 0.1 mol% and specifying tetrafluoroethylene to propylene molar ratio between 30/70 and 99/1, enabling controlled crosslinkability without requiring additional crosslinking agents
Solution Approach 2:
The invention extracts the crosslinking control function from external additives (peroxides and organic onium compounds) and transfers it to the intrinsic molecular structure of the copolymer itself, eliminating the need for separate crosslinking agents while maintaining controllable crosslinkability
2Object-generated harmful factors
If aromatic compounds such as isoindolinone pigment, quinacridone pigment, diketopyrrolopyrrole pigment or anthraquinone pigment are blended in fluorinated copolymer, then particle production during plasma irradiation is reduced, but crosslinkability control becomes difficult
Solution Approach 1:
The invention removes the need for aromatic compounds (isoindolinone pigment, quinacridone pigment, diketopyrrolopyrrole pigment, anthraquinone pigment) by achieving particle resistance through copolymer structure control alone, thereby simplifying the composition and improving crosslinkability control
Solution Approach 2:
The invention changes the copolymer composition parameters (vinylidene fluoride content less than 0.1 mol%, specific tetrafluoroethylene to propylene ratio) to simultaneously achieve both low particle production during plasma irradiation and controllable crosslinkability
3Strength
If vinylidene fluoride content is increased in fluorinated copolymer, then mechanical properties are improved, but particle production during plasma irradiation increases
Solution Approach 1:
The invention optimizes the vinylidene fluoride content parameter to less than 0.1 mol%, striking a balance between maintaining adequate mechanical properties and minimizing particle production during plasma irradiation
Solution Approach 2:
The invention creates a composite copolymer structure combining tetrafluoroethylene and propylene units in specific ratios (30/70 to 99/1), achieving a material that simultaneously provides good mechanical properties and resistance to plasma-induced particle generation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent crosslinkability and mechanical properties while minimizing particle generation during plasma irradiation, maintaining cleanability and durability in semiconductor equipment.
Implementation Method 1
A crosslinkable composition comprising a copolymer (X), an organic peroxide, a crosslinking aid, and at least one member selected from the group consisting of a quaternary ammonium salt, a quaternary phosphonium salt and an organic amine
Implementation Method 2
at least one member selected from the group consisting of a quaternary ammonium salt, a quaternary phosphonium salt and an organic amine
Implementation Method 3
the crosslinked product and the sealing material for a semiconductor production equipment containing the crosslinked product of the present invention are capable of preventing production of particles upon plasma irradiation
Data Source
AI summary
To provide a crosslinkable composition containing a fluorinated copolymer, which is excellent in crosslinkability and gives a crosslinked product being capable of suppressing production of particles upon plasma irradiation, a crosslinked product obtained by crosslinking the composition, and a sealing material for a semiconductor production equipment, containing the crosslinked product. A crosslinkable composition comprising; a copolymer (X) having an iodine atom and also having structural units based on tetrafluoroethylene and structural units based on propylene, wherein the content of structural units based on vinylidene fluoride is less than 0.1 mol% in all of the structural units; an organic peroxide; a crosslinking aid; and at least one member selected from the group consisting of a quaternary ammonium salt, a quaternary phosphonium salt and an organic amine, wherein the metal element content is less than 1 part by mass based on 100 parts by mass of the copolymer (X).