Fluorinated EUV Resist Composition for Resolution and LWR Stability
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Solution Overview
Problem
Existing actinic ray-sensitive resin compositions face challenges in achieving high resolution and stable line width roughness (LWR) performance, particularly with EUV light and electron beams, due to fluctuations in acid concentration and pattern collapse.
Innovation Solution
A resin composition with a predetermined composition, including specific compounds that generate acids upon irradiation, maintaining a specific A value and acid dissociation constant difference, and incorporating resins with acid-decomposable groups and fluorine atoms, ensures high absorption efficiency and uniform acid generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Quantity of substance
If fluorine atoms are introduced into the resist film to improve EUV light absorption efficiency, then the amount of acid generated increases, but the pattern becomes easily collapsed and resolution deteriorates
Solution Approach 1:
The patent optimizes the content ratio of fluorine-containing compounds to within 5-30 mass% and controls the A value within 0.05-0.20, finding the optimal parameter range that balances acid generation quantity with pattern stability. This resolves the contradiction by identifying specific parameter values that achieve both high acid generation and maintained resolution.
Solution Approach 2:
The patent uses composite resin compositions combining multiple resin components with specific properties (base resin, acid-decomposable resin, and fluorine-containing compound) to achieve synergistic effects. The composite structure enables both sufficient acid generation and pattern stability that neither component could achieve alone.
2Use of energy by moving object
If the same sensitivity is used for EUV light exposure, then the number of incident photons is small, but the amount of acid generated becomes insufficient and LWR performance deteriorates
Solution Approach 1:
The patent changes the compositional parameters of the resist film by introducing fluorine-containing compounds and optimizing the A value to 0.05-0.20, which significantly improves EUV light absorption efficiency. This increases the amount of acid generated per incident photon, resolving the contradiction between low photon count and sufficient acid generation.
Solution Approach 2:
The patent uses compounds with specific A values (0.05-0.20) that are optimized for EUV light absorption, effectively copying the high absorption characteristics needed for EUV lithography. This allows the resist film to efficiently convert the limited incident photons into sufficient acid generation.
3Manufacturing precision
If acid concentration fluctuation is reduced to improve LWR performance, then pattern stability improves, but the complexity of controlling composition increases
Solution Approach 1:
The patent simplifies composition control by focusing on two key parameters: the A value (0.05-0.20) and the fluorine-containing compound content (5-30 mass%). By controlling these parameters, the patent achieves uniform acid generation and stable LWR performance without requiring complex multi-component control systems.
Solution Approach 2:
The patent applies local quality by using acid-decomposable resin components that provide localized acid generation at specific sites. This creates controlled acid concentration distributions that improve LWR performance while maintaining manageable composition complexity through targeted functional groups.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves excellent resolution and LWR performance by enhancing absorption efficiency and maintaining uniform acid generation, resulting in stable pattern formation.
Implementation Method 1
a compound that generates an acid upon irradiation with actinic rays or radiation
Implementation Method 2
a method in which a fluorine atom and the like known as an atom having relatively high EUV absorption are introduced into a resist film
Data Source
AI summary
An actinic ray-sensitive or radiation-sensitive resin composition includes a resin and a compound that generates an acid upon irradiation with actinic rays or radiation, in which an A value determined by Formula (1) is 0.130 or more, and the compound that generates an acid upon irradiation with actinic rays or radiation includes one or more selected from the group consisting of a compound (I) to a compound (III).