Fluorinated Monomer Resist Composition for ArF Lithography
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Solution Overview
Problem
In ArF immersion lithography, the challenge lies in maintaining high water repellency and water slip properties to prevent defects such as blob formation during high-speed scanning, while also ensuring the resist film is not susceptible to water penetration and component leaching, which is typically addressed by introducing fluorine but can lead to new defects like 'blob defects' due to the introduction of extra fluorine.
Innovation Solution
A fluorinated monomer with recurring units containing fluorinated alkylcarbonyloxy groups is used to formulate a resist composition that exhibits excellent water repellency and water slip, reducing the occurrence of blob defects by modifying the resist film surface to be hydrophilic after development, thus minimizing defects and eliminating the need for a protective coating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Speed
If fluorine is introduced to improve water repellency and water slip properties, then water repellency and water slip are improved, but blob defects occur due to extra fluorine introduction
Solution Approach 1:
The patent applies local quality by introducing fluorinated alkylcarbonyloxy groups at specific positions within the polymer structure (recurring units containing these groups) rather than uniform fluorination throughout. This localized fluorine introduction provides water repellency and water slip properties at the surface while controlling the overall fluorine content to prevent blob defects.
Solution Approach 2:
The patent changes the chemical structure parameters of the polymer by specifically incorporating fluorinated alkylcarbonyloxy groups with defined molecular weights and structures. By controlling the type and amount of fluorinated groups (parameter changes), the patent achieves optimal water repellency and water slip while avoiding the harmful effects of excessive fluorine content.
2Reliability
If a protective coating is applied to prevent water penetration and component leaching, then water penetration and component leaching are prevented, but process complexity and cost increase
Solution Approach 1:
The patent makes the resist polymer itself multi-functional by incorporating fluorinated alkylcarbonyloxy groups that simultaneously provide water repellency, water slip properties, and protection against water penetration. This eliminates the need for a separate protective coating, reducing process complexity while maintaining reliability.
Solution Approach 2:
The patent merges the protective function with the base resist polymer by incorporating fluorinated groups into the polymer structure. Instead of having a separate protective coating layer, the protection function is combined with the resist material itself, simplifying the overall structure and process.
3Productivity
If high-speed scanning is performed to improve productivity, then productivity is improved, but water droplets remain on the resist film causing defects
Solution Approach 1:
The patent applies preliminary anti-action by pre-equipping the resist polymer with fluorinated alkylcarbonyloxy groups that provide water repellency and water slip properties before exposure. This preliminary preparation prevents water droplets from adhering to the resist film during high-speed scanning, eliminating the need for post-scanning water removal and preventing defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves high transparency and forms patterns with few development defects, maintaining water repellency and water slip properties, even at high speeds, without the need for a protective coating, thereby reducing costs and improving process efficiency.
Implementation Method 1
the fluorinated monomer is useful in forming an additive polymer to be added to formulate a radiation-sensitive resist composition having high transparency and improved development properties
Implementation Method 2
A fluorinated monomer having recurring units containing fluorinated alkylcarbonyloxy groups is used to formulate a resist composition that exhibits excellent water repellency and water slip
Data Source
AI summary
A fluorinated monomer has formula (1) wherein R1 is H, F, methyl or trifluoromethyl, R2 and R3 are H or a monovalent hydrocarbon group, R4 to R6 each are a monovalent fluorinated hydrocarbon group, A is a divalent hydrocarbon group, and k1 is 0, 1 or 2. A polymer derived from the fluorinated monomer may be endowed with appropriate water repellency, water slip, acid lability and hydrolysis and is useful as an additive polymer in formulating a resist composition.