Fluorinated Onium Salt Resist for EUV Sensitivity
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Solution Overview
Problem
Conventional chemically amplified resist compositions for electron beam or EUV lithography exhibit unsatisfactory sensitivity, which hinders the throughput and resolution in semiconductor and liquid crystal display element production.
Innovation Solution
A resist composition comprising a resin component with changed alkali solubility and an acid generator component, specifically using onium salts or sulfonium compounds with fluorinated alkyl groups, which generates acid upon exposure to improve sensitivity and pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional chemically amplified resist composition is used for electron beam or EUV lithography, then the resist material provides basic film-forming capability and acid generation, but sensitivity is unsatisfactory
Solution Approach 1:
The patent changes the chemical parameters of the acid generator component by introducing fluorinated alkyl groups with specific structures ( formulas b-0-1, b-0-2, b-1, b-2) to enhance acid generation efficiency. This parameter change in the molecular structure of component (B) directly improves sensitivity while maintaining compatibility with electron beam or EUV lithography processes
Solution Approach 2:
The patent creates a composite resist composition by combining a resin component (A) with specific fluorinated onium salts or sulfonium compounds as acid generator (B). This composite material approach integrates the film-forming properties of the resin with the enhanced acid generation capability of the fluorinated onium/sulfonium compounds, achieving both good sensitivity and process stability
2Object-affected harmful factors
If conventional resist composition is used, then the lithography process can be performed with basic materials, but contamination occurs in the exposure apparatus
Solution Approach 1:
The patent converts the potential harm of conventional acid generators that cause contamination into a benefit by using fluorinated onium salts or sulfonium compounds. The fluorinated alkyl groups in these compounds provide both the necessary acid generation capability and reduced contamination, turning a harmful conventional approach into a beneficial solution
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition achieves enhanced sensitivity and pattern resolution, reducing contamination in the exposure apparatus and maintaining stability during electron beam or EUV exposure, thereby improving the lithography process efficiency.
Implementation Method 1
an acid generator component (B) that generates acid on exposure
Implementation Method 2
a resin component (A) which exhibits changed alkali solubility under action of acid
Data Source
AI summary
A resist composition for electron beam or extreme ultraviolet (EUV), comprising a resin component (A) which exhibits changed alkali solubility under action of acid, and a photoacid generator component (B) that generates acid on exposure,wherein the component (B) comprises at least one onium salt selected from the group consisting of onium salts having an anion represented by formula (b-0-1) or (b-0-2) shown below:wherein X represents an alkylene group having 2 to 6 carbon atoms, in which at least one hydrogen atom is substituted with a fluorine atom; and each of Y and Z independently represents an alkyl group having 1 to 10 atoms, in which at least one hydrogen atom is substituted with a fluorine atom.