Fluorinated Polymer Anti-Reflective Film for Photoresist Residue Control
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Solution Overview
Problem
Existing photolithography processes in IC device manufacturing face challenges in preventing undesired photoresist residue from accumulating in exposure areas, leading to defects and degradation of process distribution.
Innovation Solution
A polymer with a specific repeating unit structure, represented by Formula 1, is used to form an anti-reflective film, which, when exposed to light, increases hydrophilicity and allows for clean removal of photoresist residue during development, thereby maintaining film thickness and uniformity.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional photolithography processes are used, then the manufacturing process can be completed, but undesired photoresist residue accumulates in exposure areas causing defects and degradation of process distribution
Solution Approach 1:
A polymer composition is introduced as an intermediary layer between the photoresist and the underlying structure. This polymer layer modifies the surface properties to prevent photoresist residue adhesion, acting as a mediator that enables clean removal of exposed photoresist while maintaining process reliability
Solution Approach 2:
The polymer composition changes the surface energy and chemical properties of the underlying structure through its specific molecular structure (containing fluorinated groups and heteroatoms). This parameter change in surface characteristics prevents photoresist residue formation and enables clean development
2Manufacturing precision
If photoresist residue is not prevented, then the manufacturing process continues, but defects occur and dimensional precision deteriorates
Solution Approach 1:
The polymer composition serves as a protective intermediary layer that prevents photoresist residue from contaminating the underlying structure during photolithography, thereby maintaining critical dimension precision and preventing manufacturing defects
Solution Approach 2:
The polymer composition converts the potentially harmful interaction between photoresist and underlying structure into a beneficial relationship where the polymer layer facilitates clean photoresist removal while protecting the underlying structure, turning the development process into a benefit rather than a source of defects
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution effectively prevents photoresist residue, ensuring precise control over critical dimensions and process distribution, enhancing the manufacturing process of IC devices.
Implementation Method 1
The developing of the photoresist film increases the hydrophilicity of a top surface of the first local region of the anti-reflective film
Data Source
AI summary
A polymer having a repeating unit represented by Formula 1:wherein each of R1, R2, and R3 is independently selected from a substituted or unsubstituted C1-C6 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms or a substituted or unsubstituted C3-C6 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 first heteroatoms, wherein at least one of R1, R2, and R3 is a hydrocarbon group substituted with a fluorine atom. R4 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 0 to 2 second heteroatoms. R5 is a C1-C10 chain-like saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms or a C3-C10 cyclic saturated or unsaturated hydrocarbon group having 1 to 6 third heteroatoms.