Fluorinated Ester-Linked Polysiloxane for Resist Pattern Rectangularity
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Solution Overview
Problem
Existing semiconductor substrate production methods face challenges in forming resist patterns with superior rectangularity of cross-sectional shape and achieving easy removal of silicon-containing films without substrate damage.
Innovation Solution
A silicon-containing composition comprising a polysiloxane compound with fluorine atoms and ester bonds, used in conjunction with a solvent, is applied to form a resist film that is developed with an organic solvent, enabling the formation of a resist pattern with improved rectangularity and facilitating easy removal of the silicon-containing film with a base-containing liquid.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional silicon-containing films are used in multilayer resist processes, then the process can be completed, but the resist patterns do not achieve superior rectangularity of cross-sectional shape and the silicon-containing films are not easily removable
Solution Approach 1:
The patent changes the chemical parameters of the silicon-containing composition by incorporating specific polysiloxane compounds with controlled molecular weights (1,000-10,000), specific functional groups (ester bonds, fluorine atoms), and controlled hydrolysis degrees (10-90%). These parameter changes enable the film to achieve both superior rectangularity in resist patterns and easy removability with base-containing liquids, resolving the technical contradiction between manufacturing precision and ease of manufacture.
Solution Approach 2:
The patent creates a composite silicon-containing film by combining polysiloxane compounds with specific functional groups (ester bonds for removability, fluorine atoms for pattern quality) and silicon sources (such as tetraethyl orthosilicate). This composite material structure allows the film to simultaneously provide the rectangularity needed for high-precision resist patterns and the chemical reactivity needed for easy removal, thus resolving the contradiction between manufacturing precision and ease of manufacture.
2Reliability
If the silicon-containing film is made more resistant to damage for substrate protection, then substrate protection is improved, but the film becomes harder to remove
Solution Approach 1:
The patent applies local quality by giving different parts of the silicon-containing film different chemical properties. The film contains polysiloxane compounds with ester bonds that are specifically designed to be reactive toward base-containing removal liquids, while other portions provide structural integrity and substrate protection. This local differentiation allows the film to simultaneously achieve high reliability for substrate protection and ease of manufacture for removal when needed.
Solution Approach 2:
The patent controls the hydrolysis degree of the polysiloxane compound within 10-90% to optimize the balance between film stability (for substrate protection) and removability. By precisely controlling this parameter along with the molecular weight and functional group composition, the film achieves appropriate adhesion to the substrate for protection while maintaining chemical reactivity for easy removal with base-containing liquids.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition allows for the formation of resist patterns with enhanced rectangularity and improves the removability of silicon-containing films, making it suitable for semiconductor substrate production.
Implementation Method 1
The polysiloxane compound includes a fluorine atom and a group including an ester bond
Data Source
AI summary
A silicon-containing composition includes a polysiloxane compound and solvent. The polysiloxane compound includes a fluorine atom and a group including an ester bond. The polysiloxane compound preferably includes a first structural unit represented by formula (1), and a second structural unit represented by formula (2). X represents a monovalent organic group having 1 to 20 carbon atoms and comprising a fluorine atom; R1 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms; Y represents a monovalent organic group having 1 to 20 carbon atoms and comprising an ester bond; and R2 represents a halogen atom, a hydroxy group, or a monovalent organic group having 1 to 20 carbon atoms.