Fluorinated Resin Pattern Formation for Defect-Free Fine Patterning
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Solution Overview
Problem
Current pattern forming methods using organic developers for fine patterns with line widths of 50 nm or less suffer from bridge defects and particle generation due to the low solubility of CF3-containing polymers, which are hydrophobic and aggregate, making it difficult to achieve precise and defect-free patterns.
Innovation Solution
A pattern forming method utilizing an actinic ray-sensitive or radiation-sensitive resin composition containing a resin with a fluorine atom but without a CF3 partial structure, which increases polarity and solubility in organic solvents, combined with a compound that generates acid upon irradiation, to reduce bridge defects and particle generation during development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If CF3-containing polymers are used in the resin composition, then the resin shows good solubility in organic developers, but the polymer aggregates and is difficult to dissolve, leading to bridge defects and particle generation
Solution Approach 1:
The patent changes the chemical structure parameter of the fluorinated resin by replacing the CF3 group with a CF2H group. This parameter change modifies the polymer's solubility characteristics, enabling it to dissolve properly in organic developers while maintaining the desired hydrophobic effects for pattern formation, thereby eliminating aggregation and defect issues
Solution Approach 2:
The patent creates a composite resin composition by combining the fluorinated resin (with CF2H group) and the alicyclic hydrocarbon resin in specific proportions. This composite material achieves synergistic effects where the fluorinated resin provides hydrophobicity and the alicyclic hydrocarbon resin provides solubility and flow characteristics, resulting in a composition that forms high-quality fine patterns without defects
2Stability of the object's composition
If the resin polarity is increased to reduce solubility in organic solvents, then aggregation is reduced, but pattern quality may be affected
Solution Approach 1:
The patent carefully controls the polarity parameter of the fluorinated resin by selecting specific fluorinated compounds with appropriate molecular weights and structures. This parameter control ensures the resin has sufficient polarity to prevent aggregation but not so much that it compromises pattern formation quality
Solution Approach 2:
The patent applies local quality by using the fluorinated resin specifically to address aggregation issues at the molecular level while the alicyclic hydrocarbon resin handles the macro-level pattern formation. Each component performs its specialized function in a specific context within the overall system
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The method effectively reduces bridge defects and particle generation, enabling the formation of precise fine patterns with improved surface localizability and contact angle characteristics, maintaining high resolution and reducing defects in negative pattern formation.
Implementation Method 1
an acid generator in the exposed area decomposes by exposure to generate an acid
Implementation Method 2
a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent
Implementation Method 3
the exposed area is removed by alkali development
Data Source
AI summary
There is provided a pattern forming method comprising (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition; (ii) a step of exposing the film; and (iii) a step of performing development by using a developer containing an organic solvent to form a negative pattern, wherein the actinic ray-sensitive or radiation-sensitive resin composition contains (A) a resin capable of increasing the polarity by an action of an acid to decrease the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and not having a CF3 partial structure.