Fluorinated Resin Resist Composition for High Resolution Patterns
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Solution Overview
Problem
Current methods for producing resist patterns face challenges in achieving high resolution and dry-etching tolerance due to limitations in the materials and processes used for resist compositions.
Innovation Solution
A compound with a specific structural unit, represented by formula (I), is incorporated into a resin, which is then used in a resist composition that includes an acid-labile group and an acid generator, allowing for improved resist pattern formation through a method involving application, drying, exposure, and heating.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional resist composition materials are used, then the manufacturing process is simple, but the resolution and dry-etching tolerance of resist patterns are insufficient
Solution Approach 1:
The patent uses a composite resin system comprising a first resin (polycyclic carbonate resin) and a second resin (resin with acid-labile group). This composite material approach allows the resist composition to achieve both high resolution and dry-etching tolerance by combining the beneficial properties of different resin types, while maintaining processability through synergistic interactions between the components.
Solution Approach 2:
The patent optimizes specific parameters including the molecular weight of the polycyclic carbonate resin (6,000-80,000), the ratio of first to second resin (95:5 to 50:50 by mass), and the content of the structural unit with formula (Ia) (5-50 mol%). By controlling these parameters, the resist composition achieves improved resolution and etching tolerance without excessive complexity.
2Manufacturing precision
If high resolution resist patterns are achieved, then manufacturing precision improves, but the process complexity increases
Solution Approach 1:
The patent introduces a specific structural unit with formula (Ia) containing fluorinated alkyl groups and alicyclic hydrocarbon groups at specific positions within the resin molecule. This local structural modification provides targeted improvement in resolution and dry-etching tolerance without requiring complete redesign of the entire resist composition system, thus limiting the increase in overall complexity.
3Reliability
If dry-etching tolerance is improved, then reliability of resist pattern increases, but the resist composition becomes more complex
Solution Approach 1:
The patent extracts and emphasizes the critical functional components needed for dry-etching tolerance: the polycyclic carbonate resin providing structural stability and the acid-labile groups enabling controlled decomposition. By focusing on these extracted essential elements and their specific ratios, the patent achieves improved reliability without unnecessary complexity in the overall composition.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enhances the resolution and dry-etching tolerance of resist patterns, improving the overall performance of the resist composition by utilizing the compound's structural unit in the resin.
Implementation Method 1
exposing the composition layer; heating the exposed composition layer
Implementation Method 2
heating the exposed composition layer
Data Source
AI summary
A compound having a group represented by formula (Ia):wherein R1 and R2 each independently represent a C1 to C8 fluorinated alkyl group, ring W represents a C5 to C18 alicyclic hydrocarbon group that may have a substituent, and * represents a binding site.