Fluorinated Resist Composition for Immersion Lithography Outgassing
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Solution Overview
Problem
As feature sizes in microelectronic devices are miniaturized, chemically amplified resist compositions face issues with image blurs due to acid diffusion, leading to reduced resolution and increased edge roughness, and existing solutions struggle with low solvent solubility of high molecular weight acid generators and polymer-bound acid generators.
Innovation Solution
A resist composition comprising a base resin, a fluorine-containing polymer, and a solvent mixture of C5-C8 ketones and monocyclic lactone ring-containing compounds is used, where the fluorine-containing polymer segregates to the resist film surface, enhancing water repellency and suppressing outgassing and edge roughness.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a fluorinated additive is added to increase water repellency on the resist surface, then water repellency is improved, but the polymer segregates on the resist surface which may cause other issues
Solution Approach 1:
The patent applies local quality by having the fluorinated polymer segregate specifically to the resist surface layer, creating a fluorinated surface region with different properties from the bulk resist composition. This allows the surface to have high water repellency while the bulk composition maintains its functional properties for lithography.
Solution Approach 2:
The patent uses composite materials by combining the base resin with a fluorinated polymer to create a resist composition with dual functionality: the base resin provides the fundamental resist properties while the fluorinated polymer provides enhanced water repellency. This composite approach allows both materials to coexist and perform their respective functions.
2Productivity
If the scanning rate of the scanner is increased to improve throughput, then productivity is improved, but water slip on the resist surface must be improved first
Solution Approach 1:
The patent applies preliminary action by pre-modifying the resist surface with a fluorinated polymer before the immersion lithography process. This preliminary surface modification ensures that when immersion lithography is performed at high scanning rates, the resist surface already has optimized water repellency and water slip properties, enabling high-speed processing without compromising performance.
3Use of energy by moving object
If sensitivity of resist material is increased for EUV lithography, then light intensity requirement is reduced, but resolution and edge roughness deteriorate
Solution Approach 1:
The patent applies parameter changes by modifying the chemical composition parameters of the resist material - specifically incorporating fluorinated polymers and optimizing the base resin structure. These compositional parameter changes enable the resist to achieve high sensitivity to EUV light while maintaining controlled acid diffusion and reduced edge roughness, thus improving both light intensity efficiency and manufacturing precision simultaneously.
4Manufacturing precision
If acid diffusion is suppressed to improve resolution, then manufacturing precision is improved, but solvent solubility of acid generators becomes problematic
Solution Approach 1:
The patent uses composite materials by combining the base resin with a fluorinated polymer in specific ratios. This composite resist composition allows the inclusion of acid generators with improved solvent solubility while maintaining controlled acid diffusion through the fluorinated polymer matrix, thus achieving both good resolution and ease of manufacture.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves water repellency and scanning rate in immersion lithography, reduces edge roughness, and suppresses outgassing in EUV lithography, thereby enhancing throughput and pattern quality.
Implementation Method 1
enhancing water repellency
Implementation Method 2
suppresses outgassing
Data Source
AI summary
A resist composition is provided comprising (A) a fluorine-containing polymer, (B) a base resin, (C) an acid generator, and (D) a solvent mixture of a first solvent which is a C5-C8 ketone, C4-C6 alcohol, C3-C6 ether or C4-C9 ester and a second solvent which is a lactone ring-containing C6-C9 compound. A pattern is formed by coating the resist composition, prebake, exposure, and development. In immersion lithography, the resist film is improved in water slip. In EB or EUV lithography, outgassing is suppressed and edge roughness is reduced.