Fluorinated Resist Composition for High Resolution and Etch Tolerance
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Solution Overview
Problem
Current resist compositions using resins with acid-labile groups and acid generators face challenges in achieving optimal resist pattern formation due to limitations in resolution and dry-etching tolerance, particularly in lithography processes.
Innovation Solution
A resist composition comprising a resin with specific structural units, including a structural unit represented by formula (a4) and a structural unit having a cyclic ether, combined with an acid-labile group and an acid generator, is applied to a substrate, dried, exposed, and developed to form a resist pattern.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a resin having an acid-labile group and an acid generator are used in the resist composition, then the resist pattern formation is enabled, but the resolution and dry-etching tolerance are insufficient
Solution Approach 1:
The patent uses a composite resin system comprising two distinct resin components: a first resin with acid-labile groups (for pattern formation) and a second resin with fluorinated groups and cyclic ether structures (for enhancing dry-etching tolerance). This composite approach allows simultaneous achievement of high resolution and improved dry-etching resistance by combining materials with complementary properties.
Solution Approach 2:
The patent introduces a resin with specific local structural characteristics - fluorinated alkyl groups (C1-C24 saturated hydrocarbon groups having fluorine atoms) and cyclic ether structures. These localized functional groups provide specific interactions that enhance dry-etching tolerance without compromising the overall pattern formation capability of the acid-labile resin component.
2Manufacturing precision
If conventional resist composition is used, then the process is simple, but the shape retention and defect reduction are insufficient
Solution Approach 1:
The patent employs a multi-component resist composition including: (A1) a resin with specific fluorinated and cyclic ether structures, (A2) a resin with acid-labile groups, and (B) an acid generator. This composite formulation achieves superior shape retention and defect reduction through synergistic interactions between components, despite the increased compositional complexity.
Solution Approach 2:
The patent specifies precise compositional parameters and structural characteristics for each resin component, including the fluorine-containing hydrocarbon group structure (formula a4), cyclic ether presence, and acid-labile group configuration. By controlling these molecular-level parameters, the resist achieves optimized shape retention and reduced defects.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition improves resist pattern formation by enhancing resolution and dry-etching tolerance, resulting in improved shape retention and reduced defects in the resist patterns.
Implementation Method 1
a resist composition including a resin having a combination of structural units below, a resin having an acid-labile group and an acid generator
Data Source
AI summary
A resist composition includes (A1) a resin which includes a structural unit represented by formula (a4), a structural unit having a cyclic ether, and the resin has no acid-labile group, (A2) a resin having an acid-labile group, and an acid generator:wherein R3 represents a hydrogen atom or a methyl group, and R4 represents a C1 to C24 saturated hydrocarbon group having a fluorine atom and a methylene group contained in the saturated hydrocarbon group may be replaced by an oxygen atom or a carbonyl group.