Fluorinated Resist Composition for Acid Diffusion and Fine Pattern Shape
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Solution Overview
Problem
Existing resist compositions struggle to achieve high sensitivity and roughness reduction while forming fine patterns with satisfactory shape and rectangularity, particularly in advanced lithography processes using extreme ultraviolet rays or electron beams.
Innovation Solution
A resist composition that includes a base material component whose solubility in a developing solution is changed by acid generation, combined with a compound represented by General Formula (d0), which traps the acid to control its diffusion, enabling the formation of high-sensitivity and low-roughness resist patterns.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators and base materials are used in chemically amplified resist compositions, then lithography characteristics such as sensitivity and resolution can be achieved, but the pattern shape rectangularity and surface roughness deteriorate at fine pattern dimensions
Solution Approach 1:
The patent modifies the chemical structure parameters of the acid diffusion control agent by introducing specific fluorinated alkyl groups (CF3, CF2CF3) and controlling the chain length (1-4 carbon atoms), which changes the diffusion characteristics and interaction with the base material, thereby improving pattern rectangularity without excessive complexity
Solution Approach 2:
The patent creates a composite resist system by combining the base material component with the specifically structured acid diffusion control agent containing fluorinated alkyl groups, where the synergistic interaction between these components achieves improved pattern shape control while managing overall composition complexity
2Measurement precision
If the wavelength of exposure light source is shortened to improve resolution, then pattern dimension precision is improved, but the resist composition requires more sophisticated acid control mechanisms that increase complexity
Solution Approach 1:
For advanced lithography with shorter wavelengths requiring higher precision, the patent optimizes the acid diffusion control agent by adjusting specific parameters: fluorinated alkyl chain length (1-4 carbons), degree of fluorination, and positioning of functional groups, which provides precise acid confinement without overly complex mechanisms
3Productivity
If acid diffusion is increased to improve sensitivity, then light exposure efficiency is improved, but pattern shape control and rectangularity deteriorate
Solution Approach 1:
The patent applies local quality control by designing the acid diffusion control agent with specific fluorinated alkyl groups that create localized acid concentration zones, allowing efficient acid generation in exposed regions while preventing excessive diffusion that would compromise pattern shape, thus balancing productivity with precision
Solution Approach 2:
The patent adjusts the diffusion parameters of the acid by modifying the chemical structure of the control agent (fluorinated alkyl chain length and composition), which optimizes the balance between acid diffusion speed (affecting sensitivity) and diffusion control (affecting pattern shape rectangularity)
4Manufacturing precision
If existing acid diffusion control agents are used, then some pattern shape control is achieved, but surface roughness and sensitivity cannot be simultaneously optimized
Solution Approach 1:
The patent optimizes surface roughness by adjusting the chemical parameters of the acid diffusion control agent, specifically the fluorinated alkyl chain length (1-4 carbons) and fluorination degree, which controls acid diffusion kinetics and thereby reduces surface roughness without requiring overly complex compositional structures
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition achieves both high sensitivity and reduced roughness, resulting in resist patterns with improved rectangularity and satisfactory shape, suitable for fine pattern formation in semiconductor manufacturing.
Implementation Method 1
an acid generator component that generates an acid upon light exposure
Implementation Method 2
an acid diffusion control agent that controls diffusion of an acid to be generated from the acid generator component upon light exposure
Data Source
AI summary
A resist composition including a base material component whose solubility in a developing solution is changed by an action of an acid and a compound represented by General Formula (d0). In Formula (d0), Rf represents a fluorinated hydrocarbon group; V0 represents a hydrocarbon group which may have a substituent or a single bond; Y0 represents a divalent linking group having an oxygen atom; I represents an iodine atom; x represents an integer of 1 to 4, y represents an integer of 1 to 4; 2≤x+y≤5 is satisfied; a total number of fluorine atoms contained in x pieces of Rf's is 5 or more; Mm+ represents a sulfonium cation or an iodonium cation; and m represents an integer of 1 or greater.