Fluorinated Salt Acid Generator for High-Resolution Photoresist Patterns
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Current photoresist compositions using acid generators struggle to produce high-resolution patterns due to limitations in the acidity and stability of the acid generated, affecting the precision and durability of the photoresist patterns.
Innovation Solution
A novel salt represented by the formula (I) is used as an acid generator in a photoresist composition, which includes a specific organic cation and anion structure, combined with a resin having acid-labile groups, to produce a photoresist pattern through a process involving application, drying, exposure, baking, and development.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in photoresist compositions, then the photoresist pattern can be formed, but the resolution and durability of the pattern are limited due to insufficient acidity and stability of the generated acid
Solution Approach 1:
The patent modifies the chemical structure of the acid generator by introducing specific fluorinated groups and cyclic hydrocarbon structures (adamantane, norbornane, norbornene, cyclohexane, or norbornanelactone rings) to enhance both the acidity and stability of the generated acid. The fluorine atoms and perfluoroalkyl groups at specific positions (Q1, Q2, R1, R2) and the rigid cyclic core structure work together to optimize the acid generation properties, thereby improving both resolution and durability simultaneously
Solution Approach 2:
The acid generator is designed as a composite molecular structure combining fluorinated aliphatic chains or rings with rigid cyclic hydrocarbon cores (adamantane, norbornane, norbornene, cyclohexane, or norbornanelactone). This composite structure leverages the electron-withdrawing effect of fluorine atoms to enhance acidity while the rigid cyclic framework provides structural stability, achieving both high resolution and durability in the photoresist pattern
2Manufacturing precision
If the acidity of the acid generator is increased to improve pattern resolution, then the resolution improves, but the stability of the acid generator and generated acid may be compromised
Solution Approach 1:
The patent optimizes the balance between acidity and stability by carefully controlling the number and position of fluorine atoms (Q1, Q2, R1, R2) and the type of cyclic hydrocarbon group (adamantane, norbornane, norbornene, cyclohexane, or norbornanelactone). The fluorine content and cyclic structure type are tuned to achieve sufficient acidity for high resolution while maintaining compositional stability for reliable acid generation
Solution Approach 2:
The composite molecular structure combines fluorinated groups (for acidity enhancement) with rigid cyclic hydrocarbon cores (for stability). The fluorinated aliphatic chains or rings provide the necessary electron-withdrawing effect to increase acidity, while the adamantane, norbornane, norbornene, cyclohexane, or norbornanelactone rings provide structural rigidity and chemical stability, achieving both high resolution and compositional stability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The novel salt-based acid generator enhances the acidity and stability of the acid generated, leading to improved resolution and durability of the photoresist patterns, addressing the limitations of existing technologies.
Implementation Method 1
a step of exposing the composition film to radiation
Data Source
AI summary
A salt represented by the formula (I):