Fluorinated Salt Acid Generator for Resist Line Edge Roughness
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Solution Overview
Problem
Existing resist compositions used in semiconductor processing fail to produce resist patterns with satisfactory line edge roughness (LER).
Innovation Solution
A salt represented by formula (I) is used in a resist composition, which includes a specific acid generator and a resin with acid-labile groups, along with a structural unit having a fluorine atom, to improve line edge roughness. The salt is synthesized through various chemical reactions and combined with other acid generators to enhance pattern formation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If conventional acid generators are used in resist composition, then the resist pattern can be formed, but the line edge roughness (LER) is not satisfactory
Solution Approach 1:
The patent modifies the chemical structure of the acid generator by introducing specific fluorinated cyclic hydrocarbon groups and adjusting the cation structure to optimize acid generation properties. This structural parameter change improves the resist pattern quality and reduces line edge roughness while maintaining reliable pattern formation
Solution Approach 2:
The patent employs a composite acid generator structure combining specific anion (fluorinated cyclic hydrocarbon group) and cation components. This composite approach creates synergistic effects that simultaneously improve line edge roughness and maintain resist pattern reliability
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resist composition using the salt (I) effectively reduces line edge roughness, resulting in improved resist pattern quality.
Implementation Method 1
a salt represented by formula (I)... as an acid generator... exposing the composition layer... heating the exposed composition layer
Data Source
AI summary
Disclosed is a salt represented by formula (I):wherein, in formula (I),Q1 and Q2 each independently represent a fluorine atom or the like,R1 and R2 each independently represent a hydrogen atom or the like,Z represents an integer of 0 to 6,X1 represents *—CO—O— or the like, where * represents a bonding site to C(R1)(R2) or C(Q1)(Q2),L1 represents a single bond or a saturated hydrocarbon group, and —CH2— included in the saturated hydrocarbon group may be replaced by —O—, —S—, —SO2— or —CO—,A1 represents a divalent alicyclic hydrocarbon group which may have a substituent,Ra represents a cyclic hydrocarbon group which may have a substituent, andZ+ represents an organic cation.