Fluorinated Silicon Compound Storage Stability

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Solution Overview

Problem

Fluorine-containing siloxane compounds in existing technologies have limitations in terms of storage stability, which affects their industrial applications.

Innovation Solution

A silicon compound represented by General Formula (x) is developed, which includes a fluorine-containing polysiloxane compound with specific structural features, such as acid unstable groups and HFIP groups, to enhance storage stability. This compound is used in a reactive material that, when polycondensed, produces a polysiloxane with improved stability and reactivity, suitable for use in photosensitive resin compositions.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If fluorine-containing siloxane compounds with existing structures are used, then reactivity and application suitability are maintained, but storage stability is insufficient

Engineering Contradiction:

Improvestorage stabilityVSAvoidapplication suitability

Core Design Contradiction:

ReliabilityVSAdaptability or versatility

Solution Approach 1:

The patent modifies the chemical structure parameters of fluorine-containing siloxane compounds by introducing specific acid unstable groups (such as t-butoxycarbonyl groups) and controlling the fluorine substitution patterns. These parameter changes in molecular structure enhance storage stability while preserving the compounds' suitability for semiconductor and display applications.

Inventive Principle:

Principle #35Parameter changes

Solution Approach 2:

The invention creates composite molecular structures combining fluorine-containing siloxane backbones with acid unstable groups. This composite approach integrates the beneficial properties of both components: the stability of siloxane structures and the protective function of acid unstable groups, achieving improved storage stability without sacrificing application performance.

Inventive Principle:

Principle #40Composite materials

2Temperature

If polysiloxane compounds are synthesized for high molecular weight, then heat resistance and transparency are improved, but storage stability remains problematic

Engineering Contradiction:

Improveheat resistanceVSAvoidstorage stability

Core Design Contradiction:

TemperatureVSReliability

Solution Approach 1:

The patent changes the chemical parameters of polysiloxane compounds by incorporating acid unstable groups into the molecular structure. This modification allows the compounds to maintain high molecular weight characteristics (providing heat resistance and transparency) while the acid unstable groups prevent premature polymerization and improve storage stability.

Inventive Principle:

Principle #35Parameter changes

3Object-affected harmful factors

If siloxane compounds are used for plasma resistance, then durability in semiconductor applications is enhanced, but storage stability needs improvement

Engineering Contradiction:

Improveoxygen plasma resistanceVSAvoidstorage stability

Core Design Contradiction:

Object-affected harmful factorsVSReliability

Solution Approach 1:

The invention develops composite siloxane structures that integrate plasma-resistant siloxane bonds with acid unstable groups. This composite design maintains the excellent oxygen plasma resistance required for semiconductor manufacturing while the acid unstable groups provide protection during storage, solving the stability problem.

Inventive Principle:

Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resulting polysiloxane compound exhibits excellent storage stability and reactivity, enabling the production of high-quality cured films with good transparency and adhesiveness, suitable for applications in semiconductor coatings and display technologies.

Implementation Method 1

attempts have been made to apply high molecular-weight compounds containing siloxane bonds

Methodology Applied

Scientific EffectPolycondensation:

Implementation Method 2

photosensitive resin composition containing a polysiloxane compound having a structure in which a benzene ring is substituted with a group represented by —C(CF3)2OX (X is a hydrogen atom or an acid unstable group)

Methodology Applied

Scientific EffectPhotoacid generation: Photodissociation

Data Source

PatentUS20230322818A1Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method of manufacturing cured film, patterned cured film, and method of manufacturing patterned cured film

Publication Date: 2023.10.12 CENT GLASS CO LTD

AI summary

There is provided a silicon compound represented by General Formula (x). There is also provided a reactive material containing a silicon compound represented by General Formula (x). In General Formula (x), in a case where a plurality of R1's are present, R1's are each independently a linear alkyl group having 1 to 10 carbon atoms, a branched alkyl group having 3 to 10 carbon atoms, a cyclic alkyl group having 3 to 10 carbon atoms, a linear alkenyl group having 2 to 10 carbon atoms, a branched alkenyl group having 3 to 10 carbon atoms, or a cyclic alkenyl group having 3 to 10 carbon atoms, where all or part of hydrogen atoms in the alkyl group or the alkenyl group may be substituted with a fluorine atom, in a case where a plurality of R2's are present, R2's are each independently a linear alkyl group having 1 to 4 carbon atoms or a branched alkyl group having 3 or 4 carbon atoms, where all or part of hydrogen atoms in the alkyl group may be substituted with a fluorine atom, RA is an acid unstable group; a is an integer of 1 to 3, b is an integer of 0 to 2, and c is an integer of 1 to 3, where a+b+c=4 is satisfied; and n is an integer of 1 to 5.