Fluorinated Urethane Resin Mold for Imprinting Durability
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Existing resin molds for photo imprinting lack durability and mold release properties when used repetitively, leading to pattern deformation and increased costs due to the need for expensive and time-consuming preparation methods.
Innovation Solution
A curable resin composition containing fluorinated urethane(meth)acrylate, specifically formulated with a photopolymerization initiator, which provides excellent mold release and durability, allowing for repetitive use without significant deterioration.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Ease of manufacture
If a resin mold is prepared by transferring a pattern on a resin using a master mold, then the preparation cost and time are reduced, but the durability of the resin mold deteriorates when transferring is repetitively performed
Solution Approach 1:
The patent changes the chemical composition parameters of the photocurable resin by incorporating fluorinated compounds (specifically fluorinated cyclic carbonate and fluorinated cyclic carboxylate) to achieve optimal balance between mold release properties and durability. The fluorine content and molecular structure are carefully controlled to prevent degradation during repetitive transfers while maintaining ease of manufacture
Solution Approach 2:
The patent creates a composite resin system by combining fluorinated cyclic carbonate, fluorinated cyclic carboxylate, and photopolymerization initiator. This composite material provides both the ease of manufacture (through simple mixing) and enhanced durability (through the synergistic effects of fluorinated compounds that improve mold release and reduce degradation during repetitive transfers)
2Productivity
If a resin mold is used for repetitive transfers, then productivity increases, but pattern deformation increases due to poor mold release properties
Solution Approach 1:
The patent modifies the chemical parameters of the resin by incorporating fluorinated cyclic carbonate and fluorinated cyclic carboxylate, which change the surface energy and molecular interactions. This enables the resin to maintain excellent mold release properties even after multiple transfers, preventing pattern deformation while sustaining high productivity
Solution Approach 2:
The patent creates a resin mold that can be used multiple times (contrary to disposable concept) by incorporating fluorinated compounds that prevent degradation. The resin mold maintains its integrity and release properties throughout its service life, enabling repetitive transfers without pattern deformation
3Device complexity
If conventional photocurable resin composition is used, then the photo imprinting process is simple, but the mold release property deteriorates leading to pattern deformation
Solution Approach 1:
The patent changes the chemical composition parameters by incorporating fluorinated cyclic carbonate and fluorinated cyclic carboxylate into the photocurable resin system. This maintains the simplicity of the photo imprinting process while dramatically improving mold release properties and preventing pattern deformation
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The resin mold exhibits improved durability and mold release properties, enabling repetitive transfers with minimal pattern deformation and reducing production costs through a more efficient photo imprinting process.
Implementation Method 1
a curable resin composition containing a fluorinated urethane(meth)acrylate... which is characterized by containing a fluorinated urethane(meth)acrylate... and a photopolymerization initiator
Data Source
AI summary
A curable resin composition comprising: a fluorinated urethane(meth)acrylate represented by formula (1),wherein, R1, R2, R3 and R4 each independently represents a hydrogen atom or a methyl group, x and y each independently represents 1 or 2, and n represents an integer within the range of 1 to 10; R3 and R4 each independently represents the hydrogen atom when x and y are both 1; R3 represents the hydrogen atom and R4 represents the methyl group when x is 1 and y is 2; R3 represents the methyl group and R4 represents the hydrogen atom when x is 2 and y is 1; and R3 and R4 each independently represents the methyl group when x and y are both 2.


