Fluorinated Yttrium Oxide Coating for Low-Temperature Etch Resistance
Find Innovative SolutionsGenerate Solutions
Solution Overview
Problem
Semiconductor manufacturing components face issues with coating degradation during use, contamination, and reduced lifetime due to etchant gases and thermal cycling, necessitating improved coatings with high purity, chemical resistance, and temperature stability.
Innovation Solution
A protective fluorinated yttrium metal oxide film is formed by depositing a metal oxide film containing yttrium via atomic layer deposition (ALD) followed by low-temperature fluoro-annealing to create a fluorinated yttrium metal oxide film, offering enhanced etch resistance and adhesion.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If high temperature processing is used to deposit coatings, then chemical resistance is improved, but thermal stress and substrate incompatibility issues worsen
Solution Approach 1:
The patent changes the processing temperature parameter from conventional high temperatures to low temperatures (below 300°C, preferably 150-250°C). This is achieved by using atomic layer deposition followed by fluoro-annealing, which allows the coating to form and fluorinate at low temperatures, eliminating thermal stress and substrate incompatibility issues while maintaining chemical resistance through the fluorinated yttrium metal oxide composition
Solution Approach 2:
The patent creates a composite protective coating by combining yttrium metal oxide with fluorine through fluoro-annealing. This composite fluorinated yttrium metal oxide structure provides both the chemical resistance of the metal oxide and the enhanced durability and low-temperature processing capability of the fluorinated compound
2Duration of action of stationary object
If coatings are applied to prolong component lifetime, then durability is improved, but coating degradation during use or cleaning worsens
Solution Approach 1:
The patent creates a protective coating that appears disposable in its thin-film nature but provides long-term protection through its fluorinated yttrium metal oxide composition. The coating is designed to be applied and then provide sustained protection against etchant gases, cleaning solutions, and thermal cycling without degradation
Solution Approach 2:
The patent changes the chemical composition parameters by introducing fluorine into the yttrium metal oxide structure through fluoro-annealing. This parameter change creates a fluorinated yttrium metal oxide coating that resists degradation from etchant gases, cleaning solutions, and thermal cycling, thereby maintaining coating stability throughout the component's operational lifetime
3Ease of operation
If periodic maintenance and cleaning are performed, then component upkeep is improved, but coating degradation and contamination worsen
Solution Approach 1:
The patent converts the potential harm of thermal cycling and cleaning exposure into a benefit by creating a fluorinated yttrium metal oxide coating that is specifically designed to resist these conditions. The fluoro-annealing process creates a coating structure that not only withstands but is enhanced by exposure to etchant gases, cleaning solutions, and thermal cycling
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The film provides superior etch resistance, crack resistance, and improved adhesion, maintaining structural integrity at elevated temperatures while extending the component's lifetime and preventing contamination.
Implementation Method 1
depositing a metal oxide film containing yttrium onto a surface of a substrate via atomic layer deposition
Implementation Method 2
The fluorination process can be fluorine ion implantation followed by annealing
Implementation Method 3
fluorine plasma processing
Implementation Method 4
fluoro-annealing the ALD metal oxide film containing yttrium at a low processing temperature
Data Source
AI summary
Articles and methods relating to coatings having superior chemical resistance and structural integrity, can be prepared via atomic layer deposition and fluoro-annealing at low process temperatures of between about 150° C. and less than 300° C. The film comprises a fluorinated metal oxide containing yttrium.