Fluorine Concentration Control in Oxygen-Containing Workpieces

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Solution Overview

Problem

Current methods for processing oxygen-containing workpieces, such as SiO2 films and quartz glass, lack effective control over fluorine concentration, which affects defect improvement and ultraviolet light transmission, and do not provide sufficient guidance on optimizing processing conditions like temperature and pressure.

Innovation Solution

A method involving three types of fluorine addition processes - chemical oxide removal using a non-plasma fluorine-containing gas, remote plasma-activated fluorine-containing radicals, and ionized fluorine-containing ions - to control fluorine concentration in oxygen-containing workpieces, with the use of a substrate processing apparatus that includes COR, PHT, and RST modules to manage these processes.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If fluorine is added to SiO2 film or quartz glass, then defect improvement and ultraviolet light transmission are enhanced, but fluorine concentration control is insufficient and processing conditions are not optimized

Engineering Contradiction:
Improvedefect improvementVSAvoidfluorine concentration control
Core Design Contradiction:
ReliabilityVSManufacturing precision

Solution Approach 1:

The patent applies parameter changes by systematically varying processing temperature, pressure, and fluorine-containing gas flow rate to control fluorine concentration in the workpiece. Different temperature ranges (e.g., room temperature to 400°C) and pressure conditions (atmospheric to reduced pressure) are used to achieve desired fluorine incorporation levels, directly resolving the contradiction between improving reliability through fluorine addition and maintaining manufacturing precision in fluorine concentration control.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The patent implements feedback control by monitoring processing conditions (temperature, pressure, gas flow) and adjusting them to achieve target fluorine concentrations. The method establishes relationships between processing parameters and fluorine incorporation, allowing real-time optimization to maintain precise fluorine concentration control while achieving defect improvement, thus resolving the technical contradiction.

Inventive Principle:
Principle #23Feedback

2Manufacturing precision

If multiple processing conditions are varied to control fluorine concentration, then manufacturing precision is improved, but device complexity increases

Engineering Contradiction:
Improvefluorine concentration controlVSAvoidprocessing conditions management
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies universality by using a single substrate processing apparatus capable of performing multiple functions: fluorine addition, chemical oxide removal, and surface treatment. The apparatus can operate under various modes (plasma and non-plasma, different pressure regimes) to achieve fluorine concentration control, thereby improving manufacturing precision without requiring multiple separate devices, thus resolving the contradiction between precision and complexity.

Inventive Principle:
Principle #6Universality (Multi-functionality)

Solution Approach 2:

The patent merges multiple processing functions (fluorine addition, oxide removal, surface modification) into a single integrated process using fluorine-containing gases. By combining these functions that can be achieved through unified processing conditions (temperature, pressure, gas composition), the patent reduces device complexity while maintaining precise fluorine concentration control, resolving the technical contradiction.

Inventive Principle:
Principle #5Merging (Combining)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach allows for precise control of fluorine concentration, reducing surface damage and enhancing etching selectivity, improving the insulating properties of SiO2 films and ultraviolet light transmission in quartz glass, while also stabilizing the oxygen-containing films and improving water repellency.

Implementation Method 1

a method of processing an oxygen-containing workpiece, the method comprising: controlling a fluorine concentration in the oxygen-containing workpiece based on at least one of a kind of a fluorine-containing processing gas, a processing temperature and a processing pressure used for processing the oxygen-containing workpiece

Methodology Applied
Scientific EffectChemical reactions: Chemical Bonding

Implementation Method 2

Patent Document 1 discloses that ultraviolet light transmission is improved when fluorine is added to quartz glass

Methodology Applied
Scientific EffectPlasma: Plasma

Data Source

PatentUS11548804B2Method and apparatus for processing oxygen-containing workpiece
Publication Date: 2023.01.10 TOKYO ELECTRON LTD
  • US11548804B2 patent drawing
  • US11548804B2 patent drawing
  • US11548804B2 patent drawing

AI summary

There is provided a method of processing an oxygen-containing workpiece. The method of processing an oxygen-containing workpiece includes controlling a fluorine concentration in the oxygen-containing workpiece based on at least one of a kind of a fluorine-containing processing gas, a processing temperature and a processing pressure used for processing the oxygen-containing workpiece.