Fluorine Elastomer Composition Plasma Aging Prevention
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Solution Overview
Problem
Fluorine-containing elastomers used in semiconductor production face challenges in maintaining heat resistance and processability under plasma exposure, experiencing weight change and generating foreign particles during fluorine and oxygen plasma treatments, which can affect semiconductor precision and cleanliness.
Innovation Solution
A fluorine-containing elastomer composition incorporating a compound with plasma antiaging effects, such as aromatic compounds like isoindolinone pigments or antioxidants, is used to enhance resistance to both fluorine and oxygen plasma, minimizing weight change and particle generation.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a fluorine-containing elastomer is used in semiconductor production, then chemical resistance and heat resistance are improved, but weight change occurs during plasma exposure
Solution Approach 1:
The patent uses a composite material system consisting of fluorine-containing elastomer combined with specific antioxidants (amino phenol type and phosphite type) to achieve both chemical resistance and weight stability during plasma exposure. The synergistic effect of the elastomer and antioxidant combination resolves the contradiction between maintaining chemical resistance and preventing weight loss.
Solution Approach 2:
The patent modifies the chemical composition parameters of the elastomer system by introducing specific antioxidant compounds with defined molecular structures (amino phenol and phosphite types) to change the degradation behavior during plasma exposure, thereby reducing weight change while maintaining chemical resistance.
2Reliability
If a fluorine-containing elastomer is used in semiconductor production, then chemical resistance is improved, but foreign particles are generated during plasma treatment
Solution Approach 1:
The composite material system of fluorine-containing elastomer with amino phenol and phosphite antioxidants prevents particle generation by forming a protective network that resists plasma degradation, thereby eliminating foreign particle contamination while maintaining chemical resistance.
Solution Approach 2:
The patent converts the potentially harmful effect of plasma exposure into a beneficial stabilization effect where the antioxidant system captures reactive species and prevents degradation, transforming what would be a source of particle generation into a protective mechanism.
3Temperature
If heat resistance is maintained under plasma exposure, then processability is improved, but weight change increases
Solution Approach 1:
The patent changes the thermal and chemical parameters of the elastomer system by incorporating antioxidants that stabilize the polymer structure at elevated temperatures during plasma exposure, maintaining heat resistance while preventing weight loss through enhanced structural stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The composition maintains heat resistance and processability, reduces weight change under plasma exposure, and prevents the formation of foreign particles, ensuring high precision and cleanliness in semiconductor production.
Implementation Method 1
a compound having plasma antiaging effects... resistant to both fluorine and oxygen plasma... minimizing weight change under plasma exposure
Data Source
AI summary
The present invention provides a fluorine containing elastomer composition which does not affect heat resistance and processability, is little in weight change for both of fluorine plasma and oxygen plasma exposed at the production step of a semiconductor and can inhibit generation of foreign objects (particles) significantly in those steps, and a molded article comprising the composition. The present invention relates to a fluorine containing elastomer composition for the seal material of a semiconductor production device comprising a fluorine containing elastomer and a compound having plasma antiaging effects.