Fluorine-Containing Polymeric Compound for Immersion Lithography
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Solution Overview
Problem
Current fluorine-containing polymeric compounds used in immersion lithography face challenges such as excessive outgassing and unsatisfactory etching resistance, and they struggle to maintain hydrophobicity, leading to reduced productivity and lithography performance due to substance elution and low water tracking ability.
Innovation Solution
A novel fluorine-containing compound and polymeric compound with specific structural units are developed, enhancing hydrophobicity and etching resistance, and incorporating acid-labile groups to improve solubility in alkali developing solutions, thereby reducing substance elution and enhancing water tracking ability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Strength
If fluorine-containing polymeric compounds are used as base resin for positive resist, then etching resistance is improved, but outgassing increases and hydrophobicity is lost
Solution Approach 1:
The patent applies local quality by introducing fluorine atoms at specific positions (R1 groups) within the polymer structure rather than uniformly throughout. This localized fluorine substitution maintains etching resistance at the interface while controlling outgassing and hydrophobicity properties in the bulk material.
Solution Approach 2:
The patent changes chemical parameters by modifying the fluorine-containing compound structure with specific ratios of fluorine substitution and acid-labile groups. By adjusting the proportion of formula (a-1) and (a-2) structural units, the resist composition achieves optimal balance between etching resistance, outgassing control, and hydrophobicity.
2Illumination intensity
If fluorine-containing polymeric compounds are used as base resin, then transparency at 193 nm is improved, but substance elution increases due to reduced hydrophobicity
Solution Approach 1:
The patent optimizes the chemical composition parameters by controlling the ratio of fluorine-containing structural units and acid-labile groups. This parameter adjustment maintains high transparency at 193 nm while regulating hydrophobicity to prevent excessive substance elution during immersion lithography.
Solution Approach 2:
The patent creates a composite resist system combining fluorine-containing polymeric compounds with acid-labile groups and specific additives. This composite formulation achieves synergistic effects where the fluorine compounds provide transparency and etching resistance while the acid-labile groups control hydrophobicity and reduce substance elution.
3Object-affected harmful factors
If conventional fluorine-containing compounds are used, then water repellency is improved, but water tracking ability decreases leading to low productivity
Solution Approach 1:
The patent applies local quality by strategically placing fluorine atoms and acid-labile groups at specific molecular positions. This creates localized hydrophobic regions that provide water repellency while maintaining overall water tracking ability through controlled hydrophilic-hydrophobic balance in the polymer structure.
Solution Approach 2:
The patent introduces dynamic functionality through acid-labile groups that can change their chemical state during the lithography process. These groups provide water repellency before exposure but become more hydrophilic after acid generation, enabling water tracking and improving productivity through dynamic adaptation to process conditions.
4Quantity of substance
If acid-labile groups are introduced to improve solubility in alkali developing solution, then etching resistance may be reduced
Solution Approach 1:
The patent optimizes the concentration and type of acid-labile groups (methoxymethyl, tert-butyl, or tert-butoxycarbonyl groups) to achieve the desired solubility in alkali developing solution while maintaining sufficient etching resistance. The ratio of acid-labile groups to fluorine-containing units is carefully controlled to balance these opposing properties.
Solution Approach 2:
The patent creates a composite structure where fluorine-containing units provide etching resistance and acid-labile groups provide solubility control. This composite approach allows the resist to exhibit both high etching resistance during the etching process and adequate solubility during development by leveraging the complementary properties of different molecular components.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The compounds exhibit improved hydrophobicity and etching resistance, reducing defects and enhancing productivity by minimizing substance elution and improving water tracking ability, while maintaining excellent lithography properties.
Implementation Method 1
resistance to a dry-etching gas (etching resistance) is unsatisfactory
Implementation Method 2
an acid generator that generates acid upon exposure
Implementation Method 3
a base resin that exhibits a changed solubility in an alkali developing solution under action of acid
Implementation Method 4
enhancing the hydrophobicity of the resist film surface, the elution of a substance can be reduced
Data Source
AI summary
A compound represented by general formula (a-i) below, and a polymeric compound having a structural unit represented by general formula (a-ii) below (wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; X represents a divalent organic group represented by general formula (x-1) below; and R1 represents an organic group having a fluorine atom).