Fluorine-Containing Polymer Resist for Liquid Immersion Lithography
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Solution Overview
Problem
Current lithographic technologies face challenges in achieving high resolution and depth of focus for microfabrication with line widths of 0.10 μm or less, particularly in liquid immersion lithography, where defects such as watermarks and bubble issues occur due to interactions with immersion liquids.
Innovation Solution
A fluorine-containing polymer with specific repeating units is used in a radiation-sensitive resin composition, which increases the receding contact angle with immersion liquids, reducing elution volume and suppressing defects by forming a resist film that is suitable for liquid immersion lithography.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If liquid immersion lithography is used to achieve high resolution, then resolution is improved, but defects such as watermarks and bubble issues occur due to interactions with immersion liquids
Solution Approach 1:
The patent modifies the chemical composition parameters of the resist polymer by incorporating fluorine-containing groups with specific molecular structures (formula 1). This changes the surface energy and wettability parameters of the resist film, thereby improving its interaction characteristics with immersion liquids and suppressing defect formation while maintaining high resolution
Solution Approach 2:
The patent creates a composite polymer structure by combining fluorine-containing repeating units (formula 1) with other polymer components. This composite material approach allows the resist to exhibit both high resolution characteristics and improved resistance to immersion liquid interactions, reducing watermarks and bubble defects
2Loss of substance
If fluorine-containing polymer is added to increase receding contact angle, then elution volume is reduced, but polymer composition complexity increases
Solution Approach 1:
The patent systematically varies the fluorine-containing repeating unit structure (formula 1) parameters, including the hydrocarbon group type (R0), substituent groups (R1, R2, R3), and fluoroalkylene group (X), to optimize the balance between reducing elution volume and maintaining manageable polymer composition complexity
Solution Approach 2:
The patent introduces fluorine-containing groups at specific local positions within the polymer structure (as side chains or terminal groups rather than throughout the entire backbone). This localized modification approach reduces elution volume effectively while minimizing the overall complexity increase of the polymer composition
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The fluorine-containing polymer composition enhances the resolution and depth of focus in microfabrication, reducing defects and improving the receding contact angle with immersion liquids, thereby addressing the limitations of existing technologies in liquid immersion lithography.
Implementation Method 1
increases the receding contact angle with immersion liquids
Data Source
AI summary
A compound has a following general formula (1).R0 represents an (n+1)-valent linear or branched aliphatic hydrocarbon group having 1 to 10 carbon atoms, or the like. R1 represents a hydrogen atom, a methyl group, or a trifluoromethyl group. R2 represents a single bond or the like. R3 represent a linear or branched alkyl group having 1 to 4 carbon atoms or the like. X represents a linear or branched fluoroalkylene group having 1 to 10 carbon atoms, and n is an integer from 1 to 5.