Fluorine Polymer Treatment for Pattern Structure Collapse Inhibition

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Solution Overview

Problem

Fine pattern structures in electronic devices, such as semiconductor substrates, tend to collapse during drying due to the evaporation of rinsing liquids, especially when surface tension forces act on the separation portions between columnar structures, leading to structural deformation or failure.

Innovation Solution

A treatment method involving a fluorine-based polymer with a repeating unit containing a fluorine atom, specifically a fluoroalkyl (meth)acrylate polymer, is applied to the pattern structure before rinsing, which reduces the surface tension of the rinsing liquid and inhibits collapse by forming a protective layer that resists dissolution in organic solvents, thereby maintaining structural integrity during drying.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a rinsing liquid is applied to clean the pattern structure, then cleaning effect is improved, but collapse of columnar structures occurs due to surface tension during evaporation

Engineering Contradiction:
Improvecleaning effectVSAvoidstructural integrity of pattern
Core Design Contradiction:
ReliabilityVSStability of the object's composition

Solution Approach 1:

A treatment liquid containing fluorine-based polymer is applied to the pattern structure before the rinsing treatment. This preliminary action forms a protective layer that prevents collapse during subsequent drying, allowing the rinsing liquid to effectively clean the structure without causing structural damage.

Inventive Principle:
Principle #10Preliminary action

Solution Approach 2:

The fluorine-based polymer acts as an intermediary substance between the rinsing liquid and the pattern structure. It forms a protective layer that mediates the interaction, reducing the harmful surface tension effects of the rinsing liquid on the columnar structures while allowing cleaning to occur.

Inventive Principle:
Principle #24Intermediary (Mediator)

2Stability of the object's composition

If conventional treatment liquids are used before rinsing, then some collapse inhibition is achieved, but the effect is insufficient depending on the type of rinsing liquids

Engineering Contradiction:
Improvecollapse inhibitionVSAvoideffectiveness across different rinsing liquids
Core Design Contradiction:
Stability of the object's compositionVSAdaptability or versatility

Solution Approach 1:

The invention uses fluorine-based polymers with specific chemical properties (low surface tension, resistance to organic solvents) that fundamentally change the interaction parameters between the treatment liquid and various rinsing liquids. This provides consistent collapse inhibition across different rinsing liquid types including water, organic solvents, and their mixtures.

Inventive Principle:
Principle #35Parameter changes

Solution Approach 2:

The treatment liquid is a composite formulation containing fluorine-based polymer(s) with specific repeating units. This composite material provides enhanced versatility and effectiveness across different rinsing liquid types compared to conventional single-component treatment liquids.

Inventive Principle:
Principle #40Composite materials

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The use of a fluorine-based polymer treatment effectively reduces capillary forces and prevents pattern structure collapse, ensuring the integrity and stability of the pattern structure even after drying, as demonstrated by reduced capillary force values and minimal damage to the film in experimental examples.

Implementation Method 1

a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom... reduces the surface tension of the rinsing liquid

Methodology Applied
Scientific EffectSurface tension reduction: Surfactant

Implementation Method 2

forming a protective layer that resists dissolution in organic solvents, thereby maintaining structural integrity during drying

Methodology Applied
Scientific EffectProtective layer formation: Coatings

Data Source

PatentUS10403491B2Method for treating pattern structure, method for manufacturing electronic device, and treatment liquid for inhibiting collapse of pattern structure
Publication Date: 2019.09.03 FUJIFILM CORP
  • US10403491B2 patent drawing
  • US10403491B2 patent drawing
  • US10403491B2 patent drawing

AI summary

Provided are a method for treating a pattern structure which is capable of inhibiting collapse of a pattern structure, a method for manufacturing an electronic device including such a treatment method, and a treatment liquid for inhibiting collapse of a pattern structure. The method for treating a pattern structure includes applying a treatment liquid containing a fluorine-based polymer having a repeating unit containing a fluorine atom to a pattern structure formed of an inorganic material.