Photocrosslinkable Fluorine Resin for Low-Exposure Pattern Formation

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Solution Overview

Problem

Existing fluorine-based resins are less photocrosslinkable and require high light exposure intensity, leading to potential performance degradation in electronic devices.

Innovation Solution

A fluorine-based resin with specific structural units, including a photocrosslinkable group and a fluorine atom, that is highly soluble in fluorine-based solvents and becomes insoluble at low light exposure intensity, providing liquid-repellency and enabling efficient pattern formation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Reliability

If a fluorine-based resin is used to prevent performance degradation in electronic devices, then liquid-repellency and solvent compatibility are improved, but photocrosslinkability deteriorates requiring high light exposure intensity

Engineering Contradiction:

Improvedevice performanceVSAvoidlight exposure intensity

Core Design Contradiction:

ReliabilityVSIllumination intensity

Solution Approach 1:

The patent creates a composite photoreactive polymeric material that combines fluorine-based resin (for liquid-repellency and solvent compatibility) with photoreactive groups (for photocrosslinkability). This composite structure allows the material to simultaneously exhibit properties of both components: the fluorine-based resin provides liquid-repellency and solvent compatibility, while the incorporated photoreactive groups enable efficient photocrosslinking at low light exposure intensity

Inventive Principle:

Principle #40Composite materials

Solution Approach 2:

The patent introduces photoreactive groups at specific locations within the polymeric material structure. By locally incorporating photoreactive functional groups into the fluorine-based resin chains, the material gains photocrosslinkability at specific sites while maintaining the overall fluorine-based resin properties such as liquid-repellency and solvent compatibility throughout the material

Inventive Principle:

Principle #3Local quality

2Manufacturing precision

If a photoreactive polymeric material is used for pattern formation, then photocrosslinking capability is improved, but solubility in fluorine-based solvents deteriorates

Engineering Contradiction:

Improvepattern formationVSAvoidsolvent compatibility

Core Design Contradiction:

Manufacturing precisionVSQuantity of substance

Solution Approach 1:

The patent modifies the chemical structure parameters of the photoreactive polymeric material by selecting specific fluorine-based resin backbones and controlling the molecular weight, functional group density, and side chain structure. These parameter adjustments optimize the balance between solubility in fluorine-based solvents and photocrosslinking efficiency, ensuring the material can be processed from solution and then crosslinked to form precise patterns

Inventive Principle:

Principle #35Parameter changes

3Productivity

If high light exposure intensity is used to achieve photocrosslinking, then photocrosslinking efficiency is improved, but performance degradation of electronic devices occurs

Engineering Contradiction:

Improvephotocrosslinking efficiencyVSAvoiddevice performance

Core Design Contradiction:

ProductivityVSReliability

Solution Approach 1:

The patent replaces the need for high mechanical/physical energy input (high light exposure intensity) with a chemically optimized system. By incorporating highly photoreactive functional groups and optimizing the molecular structure, the material achieves efficient photocrosslinking through chemical design rather than relying on high physical energy input, thereby preventing device performance degradation

Inventive Principle:

Principle #28Mechanics substitution (Replace mechanical system)

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

The resin prevents performance degradation in electronic devices by allowing pattern formation with high solubility and photocrosslinkability at low light exposure, minimizing solvent-induced damage.

Implementation Method 1

a photocrosslinkable group; and a repeating unit that includes a fluorine atom

Methodology Applied

Scientific EffectPhotocrosslinking: Photopolymerisation

Data Source

PatentEP4317225B1Fluorine resin, composition, photocrosslinked product, and electronic device provided therewith

Publication Date: 2025.12.10 TOSOH CORP

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AI summary

Provided is a fluorine-based resin that has liquid-repellency and high solubility in a fluorine-based solvent, and becomes insoluble in the solvent by photocrosslinking at low light exposure intensity. A fluorine-based resin of the present invention includes: a repeating unit that is represented by Formula (1) including a photocrosslinkable group; and a repeating unit that includes a fluorine atom, where R1 represents hydrogen or methyl, Li represents a single bond or a linking group, A represents a linking group, and R2 through R6 represent one selected from the group consisting of hydrogen, halogen, alkyl, alkyl halide, alkoxy, aryl, aryloxy, cyano, and amino.