Fluoropolyether Surface Treatment for CMP Slurry Adhesion
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Solution Overview
Problem
Conventional chemical mechanical polishing apparatuses face challenges with the adhesion of polishing slurry, which affects the workability and performance over time due to the limitations of existing surface-treating layers, such as fluorocarbon polymers or fluorinated silicone rubber.
Innovation Solution
The use of a surface-treating layer formed with a fluoropolyether group-containing compound on components of the chemical mechanical polishing apparatus, such as the surface plate, polishing head, and slurry supply parts, to suppress the adhesion and interaction with the polishing slurry, enhancing workability and durability.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If conventional surface-treating layers (fluorocarbon polymers or fluorinated silicone rubber) are used on polishing apparatus components, then initial anti-adhesion performance is provided, but workability and performance deteriorate over time due to slurry adhesion
Solution Approach 1:
The patent changes the chemical composition parameters of the surface-treating layer by using fluoropolyether group-containing compounds instead of conventional fluorocarbon polymers or fluorinated silicone rubber. This chemical parameter change provides both initial anti-adhesion performance and long-term durability, resolving the contradiction between reliability and duration of action.
Solution Approach 2:
The patent employs composite material strategy by combining fluoropolyether groups with specific molecular structures that provide both hydrophobicity and mechanical durability. This composite approach creates a surface layer that maintains anti-adhesion properties over extended periods, addressing the performance deterioration issue of conventional single-material coatings.
2Productivity
If polishing slurry contacts component surfaces, then polishing function is achieved, but slurry adhesion occurs affecting workability over time
Solution Approach 1:
The patent applies preliminary anti-action by pre-treating component surfaces with fluoropolyether group-containing compounds before polishing operations begin. This preliminary treatment creates a protective barrier that prevents slurry adhesion during the polishing process, maintaining both productivity and ease of operation throughout the polishing cycle.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The fluoropolyether group-containing compound effectively reduces the adhesion of polishing slurry, maintaining good workability and performance even after a period, thereby improving the overall efficiency and longevity of the polishing process.
Implementation Method 1
one or more of the components have a surface-treating layer formed using a fluoropolyether group-containing compound
Data Source
AI summary
A chemical mechanical polishing apparatus, including one or more components, where one or more of the components have a surface-treating layer formed using a fluoropolyether group-containing compound.