Selective Fluororesin Coating for Low-Friction Substrate Handling

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Solution Overview

Problem

Existing substrate processing apparatuses face challenges in efficiently forming friction-reducing films on substrate surfaces while minimizing interference with exposure processes, particularly due to the formation of hydrophobic films that can affect substrate handling and alignment during exposure.

Innovation Solution

A substrate processing apparatus and method that includes a hydrophobizing part for forming a hydrophobic film on the substrate surface, an ultraviolet radiation part to selectively remove the hydrophobic film from specific areas, and a resin-film forming part to create a fluororesin film in those areas, allowing precise control over film formation and reduction of friction.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Force

If a fluororesin film is formed on the entire substrate surface to reduce friction, then friction reduction is achieved, but it causes adhesion issues and affects exposure accuracy

Engineering Contradiction:
ImprovefrictionVSAvoidexposure accuracy
Core Design Contradiction:
ForceVSManufacturing precision

Solution Approach 1:

The patent applies local quality by forming the fluororesin film only in specific regions where friction reduction is needed, rather than uniformly across the entire substrate. The film is deposited in a plurality of regions while leaving other areas without the film, creating spatially varying properties that simultaneously reduce friction in contact areas and maintain adhesion in pattern formation areas.

Inventive Principle:
Principle #3Local quality

2Force

If the fluororesin film formation range is expanded to improve friction reduction, then friction between holder and substrate decreases, but adhesion in pattern areas deteriorates

Engineering Contradiction:
ImprovefrictionVSAvoidadhesion
Core Design Contradiction:
ForceVSReliability

Solution Approach 1:

The patent resolves this contradiction by implementing local quality through selective regional deposition. The fluororesin film is formed in a plurality of specific regions rather than uniformly across the entire substrate surface. This allows friction reduction to be achieved in regions where the substrate contacts the holder, while maintaining proper adhesion properties in regions where pattern formation occurs, thus balancing both requirements locally.

Inventive Principle:
Principle #3Local quality

3Force

If the fluororesin film is made thicker to enhance friction reduction, then friction decreases, but film formation control and adhesion deteriorate

Engineering Contradiction:
ImprovefrictionVSAvoidfilm formation control
Core Design Contradiction:
ForceVSManufacturing precision

Solution Approach 1:

The patent applies partial action by forming the fluororesin film in a plurality of discrete regions rather than as a continuous uniform layer. This regional deposition approach allows the film to be sufficiently thick in specific friction-prone areas to achieve friction reduction, while avoiding excessive film formation in other areas where it would cause adhesion problems or complicate pattern formation.

Inventive Principle:
Principle #16Partial or excessive action

4Manufacturing precision

If a complex multi-step process is used to form the fluororesin film with precise spatial control, then film placement accuracy improves, but process complexity increases

Engineering Contradiction:
Improvefilm placement accuracyVSAvoidprocess complexity
Core Design Contradiction:
Manufacturing precisionVSDevice complexity

Solution Approach 1:

The patent applies preliminary action by performing a hydrophobizing process on the substrate surface before forming the fluororesin film. This preliminary treatment modifies the substrate surface properties to enhance subsequent film deposition control, allowing the fluororesin film to be formed with better spatial accuracy and adhesion in the desired regions without requiring additional complex post-processing steps.

Inventive Principle:
Principle #10Preliminary action

Applied Scientific Principles

This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.

Function Achieved in This Case

This approach enables precise adjustment of fluororesin film formation to reduce friction and improve substrate handling, ensuring accurate alignment and reducing deformation during exposure processes.

Implementation Method 1

forming a hydrophobic film on a front surface of a substrate through vapor deposition of a hydrophobizing gas

Methodology Applied
Scientific EffectVapor deposition: Physical Vapour Deposition

Implementation Method 2

radiate ultraviolet rays to a removal area on a rear surface of the substrate so as to remove the hydrophobic film formed in the removal area

Methodology Applied
Scientific EffectUltraviolet radiation: Radiation

Implementation Method 3

forming a fluororesin film in the removal area after the hydrophobic film is removed

Methodology Applied
Scientific EffectVapor deposition: Physical Vapour Deposition

Data Source

PatentUS12547076B2Substrate processing apparatus and substrate processing method
Publication Date: 2026.02.10 TOKYO ELECTRON LTD
  • US12547076B2 patent drawing
  • US12547076B2 patent drawing
  • US12547076B2 patent drawing

AI summary

A substrate processing apparatus includes a hydrophobizing part configured to perform a hydrophobizing process of forming a hydrophobic film on a front surface of a substrate through vapor deposition of a hydrophobizing gas, an ultraviolet radiation part configured to radiate ultraviolet rays to a removal area on a rear surface of the substrate so as to remove the hydrophobic film formed in the removal area in the hydrophobizing process, and a resin-film forming part configured to form a fluororesin film in the removal area after the hydrophobic film is removed.