Selective Fluororesin Coating for Low-Friction Substrate Handling
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Solution Overview
Problem
Existing substrate processing apparatuses face challenges in efficiently forming friction-reducing films on substrate surfaces while minimizing interference with exposure processes, particularly due to the formation of hydrophobic films that can affect substrate handling and alignment during exposure.
Innovation Solution
A substrate processing apparatus and method that includes a hydrophobizing part for forming a hydrophobic film on the substrate surface, an ultraviolet radiation part to selectively remove the hydrophobic film from specific areas, and a resin-film forming part to create a fluororesin film in those areas, allowing precise control over film formation and reduction of friction.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Force
If a fluororesin film is formed on the entire substrate surface to reduce friction, then friction reduction is achieved, but it causes adhesion issues and affects exposure accuracy
Solution Approach 1:
The patent applies local quality by forming the fluororesin film only in specific regions where friction reduction is needed, rather than uniformly across the entire substrate. The film is deposited in a plurality of regions while leaving other areas without the film, creating spatially varying properties that simultaneously reduce friction in contact areas and maintain adhesion in pattern formation areas.
2Force
If the fluororesin film formation range is expanded to improve friction reduction, then friction between holder and substrate decreases, but adhesion in pattern areas deteriorates
Solution Approach 1:
The patent resolves this contradiction by implementing local quality through selective regional deposition. The fluororesin film is formed in a plurality of specific regions rather than uniformly across the entire substrate surface. This allows friction reduction to be achieved in regions where the substrate contacts the holder, while maintaining proper adhesion properties in regions where pattern formation occurs, thus balancing both requirements locally.
3Force
If the fluororesin film is made thicker to enhance friction reduction, then friction decreases, but film formation control and adhesion deteriorate
Solution Approach 1:
The patent applies partial action by forming the fluororesin film in a plurality of discrete regions rather than as a continuous uniform layer. This regional deposition approach allows the film to be sufficiently thick in specific friction-prone areas to achieve friction reduction, while avoiding excessive film formation in other areas where it would cause adhesion problems or complicate pattern formation.
4Manufacturing precision
If a complex multi-step process is used to form the fluororesin film with precise spatial control, then film placement accuracy improves, but process complexity increases
Solution Approach 1:
The patent applies preliminary action by performing a hydrophobizing process on the substrate surface before forming the fluororesin film. This preliminary treatment modifies the substrate surface properties to enhance subsequent film deposition control, allowing the fluororesin film to be formed with better spatial accuracy and adhesion in the desired regions without requiring additional complex post-processing steps.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
This approach enables precise adjustment of fluororesin film formation to reduce friction and improve substrate handling, ensuring accurate alignment and reducing deformation during exposure processes.
Implementation Method 1
forming a hydrophobic film on a front surface of a substrate through vapor deposition of a hydrophobizing gas
Implementation Method 2
radiate ultraviolet rays to a removal area on a rear surface of the substrate so as to remove the hydrophobic film formed in the removal area
Implementation Method 3
forming a fluororesin film in the removal area after the hydrophobic film is removed
Data Source
AI summary
A substrate processing apparatus includes a hydrophobizing part configured to perform a hydrophobizing process of forming a hydrophobic film on a front surface of a substrate through vapor deposition of a hydrophobizing gas, an ultraviolet radiation part configured to radiate ultraviolet rays to a removal area on a rear surface of the substrate so as to remove the hydrophobic film formed in the removal area in the hydrophobizing process, and a resin-film forming part configured to form a fluororesin film in the removal area after the hydrophobic film is removed.


