Focus Ring Electrical Connection via Radial Conductive Structure
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in stably holding and electrically connecting focus rings, which are crucial for adjusting the upper end position of the sheath and ensuring reliable operation during plasma processing.
Innovation Solution
A substrate support system is designed with a conductive structure and connection member that extends radially to connect the focus ring, providing a reliable electrical path while minimizing opposition to the electrostatic attractive force, and includes a holder to press the connection member downward, ensuring stable focus ring positioning and efficient heat exchange.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Reliability
If a connection member is used to electrically connect the focus ring, then electrical connection reliability is improved, but the connection member may oppose the electrostatic attractive force holding the focus ring, reducing positioning stability
Solution Approach 1:
The connection member is designed as a thin, flexible conductive structure that can bend and conform to the focus ring surface. This flexibility allows it to maintain electrical contact while minimizing mechanical interference with the electrostatic holding force, as the thin structure creates minimal opposition to the attractive force between the electrostatic chuck and the focus ring.
Solution Approach 2:
The connection member's physical parameters (thickness, conductivity, flexibility) are optimized to balance electrical performance with mechanical compatibility. By adjusting these parameters, the connection member achieves sufficient electrical conductivity while maintaining low mechanical stiffness, thereby reducing opposition to the electrostatic attractive force and preserving focus ring positioning stability.
2Reliability
If the connection member extends radially outward to provide terminal area, then electrical connection capability is improved, but device complexity increases
Solution Approach 1:
The connection member serves multiple functions simultaneously: it provides electrical connection between the focus ring and external circuitry, extends radially to create terminal areas for easy wiring access, and acts as a mechanical bridge that transfers minimal stress. This multi-functionality reduces the need for separate components, thereby lowering overall device complexity while maintaining improved electrical connection capability.
3Stability of the object's composition
If the holder presses the connection member downward to ensure stable positioning, then focus ring positioning stability is improved, but the opposing force to electrostatic attraction increases
Solution Approach 1:
The holder acts as an intermediary mechanism that indirectly stabilizes the focus ring positioning. Instead of directly pressing down on the focus ring (which would create significant opposition force), the holder presses the connection member, which in turn provides stable positioning through its rigid support structure. This indirect approach minimizes the opposing force while achieving the desired positioning stability.
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The solution enables stable electrical connection and positioning of the focus ring, suppressing opposing forces and enhancing heat exchange, thus improving the focus ring's stability and temperature adjustment efficiency within the plasma processing apparatus.
Implementation Method 1
The conductive path provides a terminal area outward in the radial direction with respect to the second support area, and extends downward from the terminal area. The connection member electrically connects the focus ring and the terminal area.
Implementation Method 2
The holder holds the connection member to press the connection member downward, and also to cause the connection member to press the surface of the focus ring.
Implementation Method 3
a focus ring is disposed to surround a substrate placed on an electrostatic chuck
Data Source
AI summary
A substrate support for a plasma processing apparatus includes a first support area configured to support a substrate placed thereon; a second support area configured to support a focus ring placed thereon, and extending in a circumferential direction outward in a radial direction with respect to the first support area; a conductive structure configured to be connected to the focus ring; and a holder configured to hold the connection member to press the connection member downward, and also to cause the connection member to press the surface of the focus ring. The conductive structure includes a first conductive path which provides a terminal area outward in the radial direction with respect to the second support area, and a connection member configured to electrically connect the focus ring and the terminal area, and disposed on the terminal area to face a surface of the focus ring.