Focus Ring Transfer in Sealed Plasma Chambers

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Solution Overview

Problem

The existing method for replacing focus rings in plasma processing systems is time-consuming and reduces productivity due to the need to open the process chamber to the atmosphere, preventing substrate processing during replacement.

Innovation Solution

A method using a transfer device to remove and replace focus rings within the plasma processing system without opening the process chamber to the atmosphere, including cleaning the mount table and transferring new focus rings, allowing for continuous operation.

Engineering Contradictions & Design Principles

VSEngineering Contradiction Analysis

1Ease of manufacture

If the process chamber is opened to the atmosphere for manual focus ring replacement, then the focus ring can be replaced, but the replacement time increases and productivity decreases

Engineering Contradiction:

Improvefocus ring replacementVSAvoidsubstrate processing throughput

Core Design Contradiction:

Ease of manufactureVSProductivity

Solution Approach 1:

A transfer device acts as an intermediary mechanism between the atmosphere and the process chamber, enabling focus ring replacement without direct atmospheric exposure. The transfer device includes a transfer chamber that can be sealed and connected to the process chamber, allowing automated transfer of focus rings while maintaining vacuum conditions.

Inventive Principle:

Principle #24Intermediary (Mediator)

Solution Approach 2:

The focus ring replacement operation is extracted from the atmospheric environment and moved into the vacuum environment of the process chamber. By transferring the focus ring replacement operation to occur within the sealed transfer chamber that connects to the process chamber, the harmful atmospheric exposure is eliminated.

Inventive Principle:

Principle #2Taking out (Extraction)

2Ease of operation

If the process chamber is opened to the atmosphere for focus ring replacement, then the focus ring can be replaced, but the process chamber must be closed again, causing time loss

Engineering Contradiction:

Improvefocus ring replacement operationVSAvoidchamber opening and closing time

Core Design Contradiction:

Ease of operationVSLoss of time

Solution Approach 1:

The chamber system is segmented into two independent sealed chambers: the process chamber and the transfer chamber. This segmentation allows the focus ring replacement to occur in the transfer chamber while the process chamber remains sealed and under vacuum, eliminating the need to open and close the process chamber.

Inventive Principle:

Principle #1Segmentation

Solution Approach 2:

The transfer chamber serves as an intermediary space that isolates the focus ring replacement operation from the process chamber. The transfer device moves the focus ring through the transfer chamber without requiring the process chamber to be opened, thus preventing time loss from chamber cycling.

Inventive Principle:

Principle #24Intermediary (Mediator)

3Ease of manufacture

If manual replacement method is used, then the focus ring can be replaced, but substrate processing must be stopped during replacement

Engineering Contradiction:

Improvefocus ring replacementVSAvoidcontinuous substrate processing

Core Design Contradiction:

Ease of manufactureVSProductivity

Solution Approach 1:

The automated transfer device enables continuous operation by performing focus ring replacement in the transfer chamber while substrate processing continues uninterrupted in the process chamber. The sealed transfer system allows maintenance operations to proceed without stopping the main production process.

Inventive Principle:

Principle #20Continuity of useful action

Solution Approach 2:

The transfer device and transfer chamber act as intermediaries that decouple the focus ring replacement operation from the substrate processing operation. This allows both operations to proceed simultaneously in separate but connected chambers, maintaining continuous productivity.

Inventive Principle:

Principle #24Intermediary (Mediator)

Data Source

PatentUS11990323B2Focus ring replacement method and plasma processing system

Publication Date: 2024.05.21 TOKYO ELECTRON LTD

AI summary

A method performed by a processor of a plasma processing system including a transfer device and a plasma processing apparatus that includes a process chamber. The process chamber includes a mount table on a surface of which a first focus ring is placed. The method includes controlling the transfer device to transfer the first focus ring out of the process chamber without opening the process chamber to the atmosphere; after the first focus ring is transferred out of the process chamber, controlling the plasma processing apparatus to clean the surface of the mount table; and after the surface of the mount table is cleaned, controlling the transfer device to transfer a second focus ring into the process chamber and place the second focus ring on the surface of the mount table without opening the process chamber to the atmosphere.