Folded Waveguide Resonator for Uniform Plasma Density
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Solution Overview
Problem
Existing plasma processing apparatuses face challenges in efficiently generating and distributing plasma density and electric field intensity, particularly in the plasma generation space, which affects the processing quality and uniformity of substrates.
Innovation Solution
A plasma processing apparatus design featuring a resonator with a folded waveguide path and conductive plates arranged alternately, coupled with a discharger to enhance electromagnetic wave resonance and distribution, ensuring uniform plasma generation and intensity across the processing space.
Engineering Contradictions & Design Principles
Engineering Contradiction Analysis
1Manufacturing precision
If a conventional waveguide structure is used to supply radio frequency waves, then the structure is simple, but the plasma density and electric field uniformity in the plasma generation space are insufficient
Solution Approach 1:
The resonator is divided into multiple conductive plates arranged in layers, with each plate segmented into multiple regions. This segmentation allows independent control of electromagnetic field distribution in different areas, achieving uniform plasma density across the plasma generation space while maintaining a modular structure that is not excessively complex
Solution Approach 2:
The waveguide path is designed to extend in multiple directions including circumferential direction around the central axis line and axial direction. This multi-dimensional waveguide configuration enables uniform distribution of radio frequency energy throughout the plasma generation space, improving plasma density uniformity without requiring an overly complex single-dimension structure
2Manufacturing precision
If the waveguide path extends only in one direction, then the structure is simple, but the electric field intensity distribution is non-uniform
Solution Approach 1:
The waveguide path is configured to extend in multiple directions including circumferential direction around the central axis line and axial direction along the central axis line. This multi-directional extension ensures uniform electric field intensity distribution throughout the plasma generation space while optimizing the overall path length to avoid excessive complexity
3Productivity
If the resonator uses a simple structure, then the device complexity is low, but the plasma generation efficiency is insufficient
Solution Approach 1:
The resonator is segmented into multiple conductive plates with multiple regions on each plate, enabling precise control of electromagnetic field distribution. This segmentation improves plasma generation efficiency by optimizing energy coupling while maintaining a modular structure that balances complexity with performance
Solution Approach 2:
The resonator structure serves multiple functions: it generates electromagnetic waves, distributes them uniformly throughout the plasma generation space, and controls plasma density distribution. This multi-functionality achieves high plasma generation efficiency without requiring separate systems for each function, thus avoiding excessive complexity
Applied Scientific Principles
This section explains which scientific principles are used to turn an abstract innovation direction into a practical engineering solution.
Function Achieved in This Case
The design achieves improved plasma density and electric field uniformity, enhancing the processing quality and consistency of substrate treatment.
Implementation Method 1
a waveguide path extending between the outer side portion and the inner side portion and including a plurality of layers arranged alternately with the plurality of conductive plates
Implementation Method 2
a resonator provided on the excitation electrode and electromagnetically coupled to the discharger
Implementation Method 3
a discharger provided to discharge electromagnetic waves into a plasma generation space below the excitation electrode
Implementation Method 4
an apparatus that excites gas using radio frequency waves such as very radio frequency (VHF) waves or ultra radio frequency (UHF) waves
Implementation Method 5
a plasma processing apparatus is used in processing a substrate
Data Source
AI summary
A plasma processing apparatus includes a chamber, a substrate support, an excitation electrode, and a resonator. The resonator includes an inner side portion and an outer side portion extending coaxially, and conductive plates arranged parallel to each other in a vertical direction. The resonator provides a waveguide path extending between the inner and outer side portions and including a plurality of layers arranged alternately with the conductive plates. Each of the plurality of layers is connected to a layer thereabove at one of a plurality of folded portions along the inner side portion or the outer side portion. A lowermost conductive plate includes a plurality of slots electromagnetically coupled to the discharger. The plurality of slots is arranged in a circumferential direction, and a wall surrounding a lowermost layer in the outer side portion extends along sides of a polygon.